Electroless thin film CoNiFe-B alloys for integrated magnetics on Si

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dc.contributor.authorRohan, James F.
dc.contributor.authorAhern, Bernadette M.
dc.contributor.authorReynolds, Ken
dc.contributor.authorCrowley, Stephan
dc.contributor.authorHealy, David A.
dc.contributor.authorRhen, Fernando M. F.
dc.contributor.authorRoy, Saibal
dc.contributor.funderScience Foundation Irelanden
dc.contributor.funderEuropean Commission
dc.date.accessioned2014-09-08T11:46:56Z
dc.date.available2014-09-08T11:46:56Z
dc.date.issued2009-02-15
dc.date.updated2013-12-18T17:55:41Z
dc.description.abstractElectroless magnetic thin films have been deposited from borane-based baths suitable for use in integrated magnetics on Si applications. The baths were developed for compatibility with standard photoresist for microfabrication of integrated magnetics on Si. The specific formulations, which differ from those reported previously, yield uniform, high saturation magnetisation (up to 2.15 T) deposits with low coercivity (<2 Oe). The resistivity of the film can be increased to minimise eddy current losses by using higher dimethylamine borane (DMAB) content or the inclusion of a second reducing agent, hypophosphite, to facilitate phosphorus codeposition of up to 7 at.%. The Ni content in the plating bath has been shown to exert significant influence over the composition, deposition rate and coercivity. XRD analysis suggests that the deposits consist of nanocrystalline phase with grains <20 nm. Such small grains are consistent with the observed low coercivity of the deposits.en
dc.description.sponsorshipScience Foundation Ireland (Principal Investigator (SFI-PI) Grant no. 06/IN.1/I98); European Commission (EU Framework V Growth program project no. G1RD-CT-2000-00427)en
dc.description.statusPeer revieweden
dc.description.versionAccepted Versionen
dc.format.mimetypeapplication/pdfen
dc.identifier.citationROHAN, J. F., AHERN, B. M., REYNOLDS, K., CROWLEY, S., HEALY, D. A., RHEN, F. M. F. & ROY, S. 2009. Electroless thin film CoNiFe–B alloys for integrated magnetics on Si. Electrochimica Acta, 54 (6), 1851-1856. http://dx.doi.org/10.1016/j.electacta.2008.10.019en
dc.identifier.doi10.1016/j.electacta.2008.10.019
dc.identifier.endpage1856en
dc.identifier.issn0013-4686
dc.identifier.issued6en
dc.identifier.journaltitleElectrochimica Actaen
dc.identifier.startpage1851en
dc.identifier.urihttps://hdl.handle.net/10468/1652
dc.identifier.volume54en
dc.language.isoenen
dc.publisherElsevieren
dc.relation.urihttp://www.sciencedirect.com/science/article/pii/S001346860801222X
dc.rightsCopyright © 2009 Elsevier Inc. All rights reserved. NOTICE: this is the author’s version of a work that was accepted for publication in Electrochimica Acta. Changes resulting from the publishing process, such as peer review, editing, corrections, structural formatting, and other quality control mechanisms may not be reflected in this document. Changes may have been made to this work since it was submitted for publication. A definitive version was subsequently published in Electrochimica Acta [Volume 54, Issue 6, 15 February 2009, Pages 1851–1856] http://dx.doi.org/10.1016/j.electacta.2008.10.019en
dc.subjectElectrolessen
dc.subjectMagneticen
dc.subjectBoraneen
dc.subjectCoercivityen
dc.subjectResistivityen
dc.titleElectroless thin film CoNiFe-B alloys for integrated magnetics on Sien
dc.typeArticle (peer-reviewed)en
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