Tyndall National Institute is one of Europe's leading research centres, specialising in Information and Communications Technology (ICT) hardware. Tyndall has a critical mass of over 360 researchers, engineers, students and support staff placing a particular emphasis on quality, accomplishment and the delivery to Ireland of value from research. Tyndall’s areas of expertise range from micro-nanolectronics, microsystems, and photonics to theory modeling supported by a central fabrication facility.
(AIP Publishing, 1999) Sinnis, Vasileios S.; Seto, M.; 't Hooft, G. W.; Watabe, Y.; Morrison, Alan P.; Hoekstra, W.; de Boer, W. B.
We report on a silicon-based resonant cavity photodiode with a buried silicon dioxide layer as the bottom reflector. The buried oxide is created by using a separation by implantation of oxygen technique. The device shows large Fabry-Perot oscillations. Resonant peaks and antiresonant troughs are observed as a function of the wavelength, with a peak responsivity of about 50 mA/W at 650 and 709 nm. The leakage current density is 85 pA/mm(2) at -5 V, and the average zero-bias capacitance is 12 pF/mm(2). We also demonstrate that the buried oxide prevents carriers generated deep within the substrate from reaching the top contacts, thus removing any slow carrier diffusion tail from the impulse response. (C) 1999 American Institute of Physics. (DOI: 10.1063/1.123499).