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Fully CMOS-compatible top-down fabrication of sub-50 nm silicon nanowire sensing devices

Georgiev, Yordan M.; Petkov, Nikolay; McCarthy, Brendan; Yu, Ran; Djara, Vladimir; O'Connell, Dan; Lotty, Olan; Nightingale, Adrian M.; Thamsumet, Nuchutha; DeMello, John C.; Blake, Alan; Das, Samaresh; Holmes, Justin D. (Elsevier, 2014-01-07)
Semiconductor nanowire fabrication via bottom-up & top-down paradigms

Hobbs, Richard G. (University College Cork, 2011-10)
Resist-substrate interface tailoring for generating high density arrays of Ge and Bi2Se3 nanowires by electron beam lithography

Hobbs, Richard G.; Schmidt, Michael; Bolger, Ciara T.; Georgiev, Yordan M.; Fleming, Peter; Morris, Michael A.; Petkov, Nikolay; Holmes, Justin D.; Xiu, Faxian; Wang, Kang L.; Djara, Vladimir; Yu, Ran; Colinge, Jean-Pierre (American Institute of Physics Publishing, 2012-06-06)
Electron beam lithography assisted high-resolution pattern generation

Gangnaik, Anushka S. (University College Cork, 2015)