Adsorption of alkanethiol self-assembled monolayers on sputtered gold substrates for atomic nanolithography applications

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dc.contributor.author O'Dwyer, Colm
dc.date.accessioned 2013-02-28T14:43:59Z
dc.date.available 2013-02-28T14:43:59Z
dc.date.copyright 2004
dc.date.issued 2004-01
dc.identifier.citation O’Dwyer, C. (2004) ‘Adsorption of Alkanethiol Self-Assembled Monolayers on Sputtered Gold Substrates for Atomic Nanolithography Applications’, 206th Meeting of the Electrochemical Society: Nanoscale Devices, Materials, and Biological Systems: Fundamental and Applications. Hilton Hawaiian Village, Honolulu, Hawaii, 3-8 October. New Jersey: The Electrochemical Society, 13, pp. 391-410. en
dc.identifier.volume 13 en
dc.identifier.startpage 391 en
dc.identifier.endpage 410 en
dc.identifier.isbn 1-56677-456-X
dc.identifier.uri http://hdl.handle.net/10468/1006
dc.description.abstract A detailed study of the self-assembly and coverage by 1-nonanethiol of sputtered Au surfaces using molecular resolution atomic force microscopy (AFM) and scanning tunneling microscopy (STM) is presented. The monolayer self-assembles on a smooth Au surface composed predominantly of {111} oriented grains. The domains of the alkanethiol monolayer are observed with sizes typically of 5-25 nm, and multiple molecular domains can exist within one Au grain. STM imaging shows that the (4 × 2) superlattice structure is observed as a (3 × 2√3) structure when imaged under noncontact AFM conditions. The 1-nonanethiol molecules reside in the threefold hollow sites of the Au{111} lattice and aligned along its [112] lattice vectors. The self-assembled monolayer (SAM) contains many nonuniformities such as pinholes, domain boundaries, and monatomic depressions which are present in the Au surface prior to SAM adsorption. The detailed observations demonstrate limitations to the application of 1-nonanethiol as a resist in atomic nanolithography experiments to feature sizes of ~20 nm. en
dc.format.mimetype application/pdf en
dc.language.iso en en
dc.publisher The Electrochemical Society en
dc.relation.ispartof 206th Meeting of the Electrochemical Society Conference, Honolulu, Hawaii, 3-8 October, 2004
dc.relation.uri http://www.electrochem.org/dl/pv/published/2004/2004.htm
dc.rights © The Electrochemical Society, Inc. 2004. All rights reserved. Except as provided under U.S. copyright law, this work may not be reproduced, resold, distributed, or modified without the express permission of The Electrochemical Society (ECS). The archival version of this work was published in O’Dwyer, C. (2004) ‘Adsorption of Alkanethiol Self-Assembled Monolayers on Sputtered Gold Substrates for Atomic Nanolithography Applications’, 206th Meeting of the Electrochemical Society: Nanoscale Devices, Materials, and Biological Systems: Fundamental and Applications. Honolulu, Hawaii, 3-8 October. New Jersey: The Electrochemical Society, 13, pp. 391-410. en
dc.subject Scanning tunneling microscopy (STM) en
dc.subject Helium atom diffraction en
dc.subject Molecular dynamics en
dc.subject Organosulfur compounds en
dc.subject Organic monolayers en
dc.subject X-ray en
dc.subject.lcsh Chemistry en
dc.subject.lcsh Materials science en
dc.title Adsorption of alkanethiol self-assembled monolayers on sputtered gold substrates for atomic nanolithography applications en
dc.type Conference item en
dc.internal.authorurl http://research.ucc.ie/profiles/D004/codwyer en
dc.internal.authorcontactother Colm O'Dwyer, Chemistry, University College Cork, Cork, Ireland. +353-21-490-3000 Email: c.odwyer@ucc.ie en
dc.internal.availability Full text available en
dc.date.updated 2012-11-30T12:08:05Z
dc.description.version Accepted Version en
dc.internal.rssid 162343067
dc.description.status Not peer reviewed en
dc.identifier.journaltitle Proceedings of the Electrochemical Society en
dc.internal.copyrightchecked No. CORA - ROMEO - Accepted Version and set statement en
dc.internal.licenseacceptance Yes en
dc.internal.conferencelocation Honolulu, Hawaii, USA en
dc.internal.IRISemailaddress c.odwyer@ucc.ie en


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