A study of anodic films on n-InP by spectroscopic ellipsometry and atomic force microscopy

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dc.contributor.author Buckley, D. Noel
dc.contributor.author O'Dwyer, Colm
dc.contributor.author Melly, T.
dc.contributor.author Serantoni, M.
dc.contributor.author Sutton, David
dc.contributor.author Newcomb, Simon B.
dc.date.accessioned 2013-03-04T17:01:04Z
dc.date.available 2013-03-04T17:01:04Z
dc.date.copyright 2003
dc.date.issued 2003-01
dc.identifier.citation Buckley, D. N., O’Dwyer, C., Melly, T., Serantoni, M., Sutton, D., Newcomb, S. B. (2003) 'A Study of Anodic Films on n-InP by Spectroscopic Ellipsometry and Atomic Force Microscopy', 204th Meeting of the Electrochemical Society, Orlando FL, USA, 12-16 October. Pennington, NJ: The Electrochemical Society, 11, pp. 136-151. en
dc.identifier.volume 11 en
dc.identifier.startpage 136 en
dc.identifier.endpage 151 en
dc.identifier.isbn 1-56677-391-1
dc.identifier.uri http://hdl.handle.net/10468/1013
dc.description.abstract The growth of anodic films on n-InP in 1 mol dm-1 KOH is investigated under potential sweep conditions. At lower potentials a thin surface film is formed and a peak is observed on the current-voltage curve. Ellipsometric measurements show that this film increases in thickness with increasing potential but the observed thickness values are significantly less than the corresponding coulometrically estimated values. This indicates that much of the charge passed is not involved in the formation of a surface film but presumably in the formation of soluble anodic reaction products. Cyclic voltammograms show that a current peak is also observed on the reverse sweep and ellipsometric measurements show that the anodic film thickness also increases during the reverse sweep until the peak potential is reached. Atomic force microscopy (AFM) shows that the surface becomes smoother as the potential is increased. We attribute this to the formation of nuclei at lower potentials, which coalesce as the layer becomes thicker. Electron diffraction and x-ray photoelectron spectroscopy (XPS) analysis show that the surface film is predominantly In2O3 with no evidence of InPO4. en
dc.format.mimetype application/pdf en
dc.language.iso en en
dc.publisher The Electrochemical Society en
dc.relation.isformatof 204th Meeting of the Electrochemical Society Conference, Orlando FL, USA, 12-16 October, 2003.
dc.relation.uri http://www.electrochem.org/dl/pv/published/2003/2003.htm#204pub
dc.rights © The Electrochemical Society, Inc. 2003. All rights reserved. Except as provided under U.S. copyright law, this work may not be reproduced, resold, distributed, or modified without the express permission of The Electrochemical Society (ECS). The archival version of this work was published in Buckley, D. N., O’Dwyer, C., Melly, T., Serantoni, M., Sutton, D., Newcomb, S. B. (2003) 'A Study of Anodic Films on n-InP by Spectroscopic Ellipsometry and Atomic Force Microscopy', 204th Meeting of the Electrochemical Society, Orlando FL, USA, 12-16 October. Pennington, NJ: The Electrochemical Society, 11, pp. 136-151. en
dc.subject Anodic film en
dc.subject n-InP en
dc.subject Ellipsometric measurement en
dc.subject Coulometry en
dc.subject Cyclic voltammogram (CV) en
dc.subject Atomic force microscopy (AFM) en
dc.subject X-ray photoelectron spectroscopy (XPS) en
dc.subject.lcsh Electrochemistry en
dc.subject.lcsh Materials science en
dc.title A study of anodic films on n-InP by spectroscopic ellipsometry and atomic force microscopy en
dc.type Conference item en
dc.internal.authorurl http://research.ucc.ie/profiles/D004/codwyer en
dc.internal.authorcontactother Colm O'Dwyer, Chemistry, University College Cork, Cork, Ireland. +353-21-490-3000 Email: c.odwyer@ucc.ie en
dc.internal.availability Full text available en
dc.date.updated 2012-11-30T12:11:28Z
dc.description.version Accepted Version en
dc.internal.rssid 162343103
dc.description.status Peer reviewed en
dc.identifier.journaltitle Proc. Electrochem. Soc. en
dc.internal.copyrightchecked No en
dc.internal.licenseacceptance Yes en
dc.internal.conferencelocation Orlando, Florida, USA en
dc.internal.IRISemailaddress c.odwyer@ucc.ie en


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