High aspect ratio iridescent three-dimensional metal–insulator–metal capacitors using atomic layer deposition
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Date
2014-07-28
Authors
Burke, Micheal
Blake, Alan
Djara, Vladimir
O'Connell, Dan
Povey, Ian M.
Cherkaoui, Karim
Monaghan, Scott
Scully, Jim
Murphy, Richard
Hurley, Paul K.
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Publisher
American Institute of Physics on behalf of the American Vacuum Society
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Abstract
The authors report on the structural and electrical properties of TiN/Al2O3/TiN metal–insulator–metal (MIM) capacitor structures in submicron three-dimensional (3D) trench geometries with an aspect ratio of ∼30. A simplified process route was employed where the three layers for the MIM stack were deposited using atomic layer deposition (ALD) in a single run at a process temperature of 250 °C. The TiN top and bottom electrodes were deposited via plasma-enhanced ALD using a tetrakis(dimethylamino)titanium precursor. 3D trench devices yielded capacitance densities of 36 fF/μm2 and quality factors >65 at low frequency (200 Hz), with low leakage current densities (<3 nA/cm2 at 1 V). These devices also show strong optical iridescence which, when combined with the covert embedded capacitance, show potential for system in package (SiP) anticounterfeiting applications.
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Keywords
TiN/Al2O3/TiN metal–insulator–metal (MIM) capacitor structures
Citation
Burke, M., Blake, A., Djara, V., O'Connell, D., Povey, I. M., Cherkaoui, K., Monaghan, S., Scully, J., Murphy, R., Hurley, P. K., Pemble, M. E. and Quinn, A. J. (2014) 'High aspect ratio iridescent three-dimensional metal--insulator--metal capacitors using atomic layer deposition', Journal of Vacuum Science and Technology A, 33(1), 01A103 (5pp). doi: 10.1116/1.4891319
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© 2014, American Vacuum Society. This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared as: Burke, M., Blake, A., Djara, V., O'Connell, D., Povey, I. M., Cherkaoui, K., Monaghan, S., Scully, J., Murphy, R., Hurley, P. K., Pemble, M. E. and Quinn, A. J. (2014) 'High aspect ratio iridescent three-dimensional metal--insulator--metal capacitors using atomic layer deposition', Journal of Vacuum Science and Technology A, 33(1), 01A103 (5pp), doi: 10.1116/1.4891319, and may be found at: https://doi.org/10.1116/1.4891319