Fabrication of three-dimensional substrates for Li microbatteries on Si
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Accepted Version
Date
2009-11-15
Authors
Jeyaseelan, Arockia Vimal
Rohan, James F.
Journal Title
Journal ISSN
Volume Title
Publisher
Elsevier
Published Version
Abstract
Lithographic techniques for patterning planar substrates to achieve microbattery materials compatible three-dimensional (3D) Ni substrates for sequential deposition of active battery materials are described. A single spin negative photoresist is used to achieve 100 mu m pattern heights. After patterning, Ni is electroplated on the substrates from a low stress Ni sulphamate bath to a maximum of 100 mu m. The sidewall angle achieved yields a thinner Ni feature at the surface level than at the base which is a key parameter to facilitate subsequent active battery materials deposition by vacuum deposition techniques. An aspect ratio of 1.5:1 has been achieved and the surface area is increased by comparison with planar electrodes.
Description
Keywords
Microfabrication , 3D , Microbattery , Anode , Silicon , Lithium , Thin , Films
Citation
JEYASEELAN, A. V. & ROHAN, J. F. 2009. Fabrication of three-dimensional substrates for Li microbatteries on Si. Applied Surface Science, 256, S61-S64. doi: http://dx.doi.org/10.1016/j.apsusc.2009.04.190
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Copyright
Copyright © 2009 Elsevier Inc. All rights reserved. NOTICE: this is the author’s version of a work that was accepted for publication in Applied Surface Science. Changes resulting from the publishing process, such as peer review, editing, corrections, structural formatting, and other quality control mechanisms may not be reflected in this document. Changes may have been made to this work since it was submitted for publication. A definitive version was subsequently published in Applied Surface Science [Volume 256, Issue 3, Supplement, 15 November 2009, Pages S61–S64] http://dx.doi.org/10.1016/j.apsusc.2009.04.190