Copper reduction and atomic layer deposition by oxidative decomposition of formate by hydrazine

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Date
2014
Authors
Dey, Gangotri
Elliott, Simon D.
Journal Title
Journal ISSN
Volume Title
Publisher
The Royal Society of Chemistry
Published Version
10.1039/C4RA07003H
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Abstract
We have used density functional theory (DFT) to study the mechanism of three step atomic layer deposition (ALD) of copper via formate and hydrazine. The technique holds promise for deposition of other transition metals.
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Keywords
Density functional theory (DFT) , Atomic layer deposition (ALD)
Citation
DEY, G. & ELLIOT, S. D. 2014. Copper reduction and atomic layer deposition by oxidative decomposition of formate by hydrazine. RSC Advances. 4, 34448-34453. http://dx.doi.org/10.1039/C4RA07003H
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URI
https://hdl.handle.net/10468/1577
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Tyndall National Institute - Journal Articles
Copyright
© The Royal Society of Chemistry 2014. Reproduced by permission of The Royal Society of Chemistry.