Copper reduction and atomic layer deposition by oxidative decomposition of formate by hydrazine

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dc.contributor.author Dey, Gangotri
dc.contributor.author Elliott, Simon D.
dc.date.accessioned 2014-06-16T12:15:13Z
dc.date.available 2015-07-30T04:00:06Z
dc.date.issued 2014
dc.identifier.citation DEY, G. & ELLIOT, S. D. 2014. Copper reduction and atomic layer deposition by oxidative decomposition of formate by hydrazine. RSC Advances. 4, 34448-34453. http://dx.doi.org/10.1039/C4RA07003H en
dc.identifier.startpage 34448
dc.identifier.endpage 34453
dc.identifier.issn 2046-2069
dc.identifier.uri http://hdl.handle.net/10468/1577
dc.identifier.doi 10.1039/C4RA07003H
dc.description.abstract We have used density functional theory (DFT) to study the mechanism of three step atomic layer deposition (ALD) of copper via formate and hydrazine. The technique holds promise for deposition of other transition metals. en
dc.description.sponsorship Science Foundation Ireland (ALDesign project, grant number 09.IN1.I2628) en
dc.format.mimetype application/pdf en
dc.language.iso en en
dc.publisher The Royal Society of Chemistry en
dc.rights © The Royal Society of Chemistry 2014. Reproduced by permission of The Royal Society of Chemistry. en
dc.subject Density functional theory (DFT) en
dc.subject Atomic layer deposition (ALD) en
dc.subject.lcsh Atomic layer deposition en
dc.subject.lcsh Density functional theory en
dc.title Copper reduction and atomic layer deposition by oxidative decomposition of formate by hydrazine en
dc.internal.availability Full text available en
dc.description.version Accepted Version en
dc.internal.rssid 283617573
dc.contributor.funder Science Foundation Ireland en
dc.description.status Peer reviewed en
dc.identifier.journaltitle RSC Advances en
dc.internal.IRISemailaddress simon.elliott@tyndall.ie en


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