Electroless thin film CoNiFe-B alloys for integrated magnetics on Si

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dc.contributor.author Rohan, James F.
dc.contributor.author Ahern, Bernadette M.
dc.contributor.author Reynolds, Ken
dc.contributor.author Crowley, Stephan
dc.contributor.author Healy, David A.
dc.contributor.author Rhen, Fernando M. F.
dc.contributor.author Roy, Saibal
dc.date.accessioned 2014-09-08T11:46:56Z
dc.date.available 2014-09-08T11:46:56Z
dc.date.issued 2009-02-15
dc.identifier.citation ROHAN, J. F., AHERN, B. M., REYNOLDS, K., CROWLEY, S., HEALY, D. A., RHEN, F. M. F. & ROY, S. 2009. Electroless thin film CoNiFe–B alloys for integrated magnetics on Si. Electrochimica Acta, 54 (6), 1851-1856. http://dx.doi.org/10.1016/j.electacta.2008.10.019 en
dc.identifier.volume 54 en
dc.identifier.issued 6 en
dc.identifier.startpage 1851 en
dc.identifier.endpage 1856 en
dc.identifier.issn 0013-4686
dc.identifier.uri http://hdl.handle.net/10468/1652
dc.identifier.doi 10.1016/j.electacta.2008.10.019
dc.description.abstract Electroless magnetic thin films have been deposited from borane-based baths suitable for use in integrated magnetics on Si applications. The baths were developed for compatibility with standard photoresist for microfabrication of integrated magnetics on Si. The specific formulations, which differ from those reported previously, yield uniform, high saturation magnetisation (up to 2.15 T) deposits with low coercivity (<2 Oe). The resistivity of the film can be increased to minimise eddy current losses by using higher dimethylamine borane (DMAB) content or the inclusion of a second reducing agent, hypophosphite, to facilitate phosphorus codeposition of up to 7 at.%. The Ni content in the plating bath has been shown to exert significant influence over the composition, deposition rate and coercivity. XRD analysis suggests that the deposits consist of nanocrystalline phase with grains <20 nm. Such small grains are consistent with the observed low coercivity of the deposits. en
dc.description.sponsorship Science Foundation Ireland (Principal Investigator (SFI-PI) Grant no. 06/IN.1/I98); European Commission (EU Framework V Growth program project no. G1RD-CT-2000-00427) en
dc.format.mimetype application/pdf en
dc.language.iso en en
dc.publisher Elsevier en
dc.relation.uri http://www.sciencedirect.com/science/article/pii/S001346860801222X
dc.rights Copyright © 2009 Elsevier Inc. All rights reserved. NOTICE: this is the author’s version of a work that was accepted for publication in Electrochimica Acta. Changes resulting from the publishing process, such as peer review, editing, corrections, structural formatting, and other quality control mechanisms may not be reflected in this document. Changes may have been made to this work since it was submitted for publication. A definitive version was subsequently published in Electrochimica Acta [Volume 54, Issue 6, 15 February 2009, Pages 1851–1856] http://dx.doi.org/10.1016/j.electacta.2008.10.019 en
dc.subject Electroless en
dc.subject Magnetic en
dc.subject Borane en
dc.subject Coercivity en
dc.subject Resistivity en
dc.title Electroless thin film CoNiFe-B alloys for integrated magnetics on Si en
dc.type Article (peer-reviewed) en
dc.internal.authorurl http://www.tyndall.ie en
dc.internal.authorcontactother James Rohan, Tyndall Microsystems, University College Cork, Cork, Ireland. +353-21-490-3000 Email: james.rohan@tyndall.ie en
dc.internal.availability Full text available en
dc.date.updated 2013-12-18T17:55:41Z
dc.description.version Accepted Version en
dc.internal.rssid 89608802
dc.contributor.funder Science Foundation Ireland en
dc.contributor.funder European Commission
dc.description.status Peer reviewed en
dc.identifier.journaltitle Electrochimica Acta en
dc.internal.copyrightchecked No. CORA!! AV permitted & set statement en
dc.internal.licenseacceptance Yes en
dc.internal.IRISemailaddress james.rohan@tyndall.ie en


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