Development of block copolymer lithography for device structure fabrication

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dc.contributor.advisor Morris, Michael A. en Senthamaraikannan, Ramsankar 2015-12-09T09:07:45Z 2015-12-09T09:07:45Z 2014 2014
dc.identifier.citation Senthamaraikannan, R. 2014. Development of block copolymer lithography for device structure fabrication. PhD Thesis, University College Cork. en
dc.identifier.endpage 142
dc.description.abstract This thesis investigated well-ordered block copolymer (BCP) thin film characteristics and their use for nanoscale pattern formation using a series of polystyrene-block-polymethylmethacrylate (PS-b-PMMA), polystyrene-blockpolydimethylsiloxane (PS-b-PDMS) and polystyrene-block-poly(ethylene oxide) (PS-b-PEO) systems of various molecular weights. BCP thin films, which act as an ‘on-chip’ etch mask and material templates, are highly promising self-assembling process for future scalable nanolithography. Unlike conventional BCP processing methods, the work in this thesis demonstrates that well-ordered patterns can be achieved in a few seconds compared to several hours by use of a non-conventional microwave assisted technique. As a result, well-ordered BCP nanoscale structures can be developed in industry appropriate periods facilitating their incorporation into current technologies. An optimised and controlled plasma dry etch process was used for successful pattern transfer to the underlying silicon substrate. Long range ordered BCP templates were further modified by selective metal inclusion technique to form a hard mask template towards fabrication of high aspect ratio nanopillars and nanowires. The work described here is centred on how these templates might be used to generate function at substrate surfaces. Herein we describe a number of innovations which might allow their successful uptake in a number of applications. en
dc.format.mimetype application/pdf en
dc.language.iso en en
dc.publisher University College Cork en
dc.rights © 2014, Ramsankar Senthamaraikannan. en
dc.rights.uri en
dc.subject Self-assembly en
dc.subject PS-b-PMMA en
dc.subject PS-b-PDMS en
dc.subject PS-b-PEO en
dc.subject BCP en
dc.subject Block copolymer en
dc.subject Nanolithography en
dc.subject Microwave en
dc.subject Plasma dry etch en
dc.subject Hard mask en
dc.subject Moore's law en
dc.title Development of block copolymer lithography for device structure fabrication en
dc.type Doctoral thesis en
dc.type.qualificationlevel Doctoral en
dc.type.qualificationname PhD (Science) en
dc.internal.availability Full text available en No embargo required en
dc.description.version Accepted Version
dc.contributor.funder Science Foundation Ireland en
dc.description.status Not peer reviewed en Chemistry en
dc.check.type No Embargo Required
dc.check.reason No embargo required en
dc.check.opt-out Not applicable en
dc.thesis.opt-out false
dc.check.embargoformat Not applicable en
dc.internal.conferring Summer Conferring 2015

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© 2014, Ramsankar Senthamaraikannan. Except where otherwise noted, this item's license is described as © 2014, Ramsankar Senthamaraikannan.
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