A bottom-up fabrication method for the production of visible light active photonic crystals

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dc.contributor.author Padmanabhan, Sibu C.
dc.contributor.author Linehan, Keith
dc.contributor.author O'Brien, Shane
dc.contributor.author Kassim, Syara
dc.contributor.author Doyle, Hugh
dc.contributor.author Povey, Ian M.
dc.contributor.author Schmidt, Michael
dc.contributor.author Pemble, Martyn E.
dc.date.accessioned 2016-05-05T08:39:35Z
dc.date.available 2016-05-05T08:39:35Z
dc.date.issued 2014-01-06
dc.identifier.citation PADMANABHAN, S. C., LINEHAN, K., O'BRIEN, S., KASSIM, S., DOYLE, H., POVEY, I. M., SCHMIDT, M. & PEMBLE, M. E. 2014. A bottom-up fabrication method for the production of visible light active photonic crystals. Journal of Materials Chemistry C, 2, pp. 1675-1682. doi: 10.1039/C3TC31994F en
dc.identifier.volume 2 en
dc.identifier.startpage 1675 en
dc.identifier.endpage 1682 en
dc.identifier.issn 2050-7526
dc.identifier.uri http://hdl.handle.net/10468/2506
dc.identifier.doi 10.1039/c3tc31994f
dc.description.abstract A method which combines polymer particle assembly, chemical infiltration and etching with an aerosol assisted deposition process is described for the fabrication of 3D inverse opal (10) structures with sub-micron periodicity and precision. This procedure not only overcomes limitations associated with slow, expensive micro-fabrication methods but also permits the tuning of refractive index contrast via the direct incorporation of photonically-active, preformed, tailored silicon nanostructures. It is demonstrated that this approach can be used to modify the photonic band gap (PBG) by effectively depositing/patterning optically active silicon nanocrystals (ncSi) onto the pore walls of a 3D inverse opal structure. This simple, yet effective method for preparing functional complex 3D structures has the potential to be used generically to fabricate a variety of functional porous 3D structures that could find application not only in new or improved photonic crystal (PC) devices but also in areas such as catalysis, separation, fuel cells technology, microelectronics and optoelectronics. en
dc.description.sponsorship Science Foundation Ireland (SFI Grant Number: PI 07/IN.1/1787) en
dc.format.mimetype application/pdf en
dc.language.iso en en
dc.publisher Royal Society of Chemistry en
dc.rights © 2014, the Authors. en
dc.subject Atomic layer deposition en
dc.subject Inverse opals en
dc.subject Spontaneous emission en
dc.subject Band gap en
dc.subject Optical properties en
dc.subject Photonic en
dc.title A bottom-up fabrication method for the production of visible light active photonic crystals en
dc.type Article (peer-reviewed) en
dc.internal.authorcontactother Hugh Doyle, Micro-Nanoelectronics Centre, Tyndall National Institute, Cork, Ireland. +353-21-490-4310 Email: hugh.doyle@tyndall.ie en
dc.internal.availability Full text available en
dc.date.updated 2016-04-10T17:50:20Z
dc.description.version Published Version en
dc.internal.rssid 271355704
dc.internal.wokid 000331917600014
dc.contributor.funder Science Foundation Ireland en
dc.description.status Peer reviewed en
dc.identifier.journaltitle Journal of Materials Chemistry C en
dc.internal.copyrightchecked Yes. !!CORA!! AV permitted by the publisher: "Accepted manuscripts may be distributed via repositories after an embargo period of 12 months". Must include a link to the version of record. http://www.rsc.org/journals-books-databases/open-access/green-open-access/ en
dc.internal.licenseacceptance Yes en
dc.internal.IRISemailaddress hugh.doyle@tyndall.ie en


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