Low resistivity Pt interconnects developed by electron beam assisted deposition using novel gas injector system

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dc.contributor.author Dias, R. J.
dc.contributor.author O'Regan, Colm
dc.contributor.author Thrompenaars, P.
dc.contributor.author Romano-Rodriguez, A.
dc.contributor.author Holmes, Justin D.
dc.contributor.author Mulder, J. J. L.
dc.contributor.author Petkov, Nikolay
dc.contributor.editor Vol. 371
dc.date.accessioned 2016-05-20T09:02:31Z
dc.date.available 2016-05-20T09:02:31Z
dc.date.issued 2012-07-02
dc.identifier.citation Dias, R. J., Regan, C. O., Thrompenaars, P., Romano-Rodriguez, A., Holmes, J. D., Mulder, J. J. L. & Petkov, N. 2012. Low resistivity Pt interconnects developed by electron beam assisted deposition using novel gas injector system. Journal of Physics: Conference Series, 371, 012038. http://stacks.iop.org/1742-6596/371/i=1/a=012038 en
dc.identifier.volume 371 en
dc.identifier.issued 1 en
dc.identifier.startpage 012038(1) en
dc.identifier.endpage 012038(4) en
dc.identifier.issn 1742-6596
dc.identifier.uri http://hdl.handle.net/10468/2591
dc.identifier.doi 10.1088/1742-6596/371/1/012038
dc.description.abstract Electron beam-induced deposition (EBID) is a direct write process where an electron beam locally decomposes a precursor gas leaving behind non-volatile deposits. It is a fast and relatively in-expensive method designed to develop conductive (metal) or isolating (oxide) nanostructures. Unfortunately the EBID process results in deposition of metal nanostructures with relatively high resistivity because the gas precursors employed are hydrocarbon based. We have developed deposition protocols using novel gas-injector system (GIS) with a carbon free Pt precursor. Interconnect type structures were deposited on preformed metal architectures. The obtained structures were analysed by cross-sectional TEM and their electrical properties were analysed ex-situ using four point probe electrical tests. The results suggest that both the structural and electrical characteristics differ significantly from those of Pt interconnects deposited by conventional hydrocarbon based precursors, and show great promise for the development of low resistivity electrical contacts. en
dc.description.sponsorship Science Foundation Ireland (SFI 09/SIRG/I1621) en
dc.description.uri http://iopscience.iop.org/issue/1742-6596/371/1 en
dc.format.mimetype application/pdf en
dc.language.iso en en
dc.publisher IOP Publishing en
dc.rights © The authors, 2012. Published under licence in Journal of Physics: Conference Series by IOP Publishing Ltd. CC-BY Content from this work may be used under the terms of the Creative Commons Attribution 3.0 licence. Any further distribution of this work must maintain attribution to the authors and the title of the work, journal citation and DOI. en
dc.rights.uri http://creativecommons.org/licenses/by/3.0/ en
dc.subject Electron beam-induced deposition en
dc.subject EBID en
dc.subject Low resistivity en
dc.subject Nanostructures en
dc.subject Functional materials en
dc.subject Electron microscopy en
dc.title Low resistivity Pt interconnects developed by electron beam assisted deposition using novel gas injector system en
dc.type Conference item en
dc.internal.authorcontactother Justin D. Holmes, Chemistry, University College Cork, Cork, Ireland. +353-21-490-3000 Email: j.holmes@ucc.ie en
dc.internal.availability Full text available en
dc.date.updated 2013-03-07T21:46:06Z
dc.description.version Published Version en
dc.internal.rssid 170451661
dc.contributor.funder Science Foundation Ireland en
dc.description.status Peer reviewed en
dc.identifier.journaltitle Journal of Physics: Conference Series en
dc.internal.copyrightchecked No. !!CORA!! Yes en
dc.internal.licenseacceptance Yes en
dc.internal.conferencelocation Birmingham, UK en
dc.internal.IRISemailaddress j.holmes@ucc.ie en


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© The authors, 2012. Published under licence in Journal of Physics: Conference Series by IOP Publishing Ltd. CC-BY Content from this work may be used under the terms of the Creative Commons Attribution 3.0 licence. Any further distribution of this work must maintain attribution to the authors and the title of the work, journal citation and DOI. Except where otherwise noted, this item's license is described as © The authors, 2012. Published under licence in Journal of Physics: Conference Series by IOP Publishing Ltd. CC-BY Content from this work may be used under the terms of the Creative Commons Attribution 3.0 licence. Any further distribution of this work must maintain attribution to the authors and the title of the work, journal citation and DOI.
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