Optical emission of strained direct-band-gap Ge quantum well embedded inside InGaAs alloy layers

Pavarelli, Nicola; Ochalski, Tomasz J.; Murphy-Armando, Felipe; Huo, Y.; Schmidt, Michael; Huyet, Guillaume; Harris, J. S.

Optical emission of strained direct-band-gap Ge quantum well embedded inside InGaAs alloy layers

Files

PhysRevLett.110.177404.pdf(1.7 MB)

Published Version

Date

2013-04-25

Authors

Pavarelli, Nicola

Ochalski, Tomasz J.

Murphy-Armando, Felipe

Huo, Y.

Schmidt, Michael

Huyet, Guillaume

Harris, J. S.

Publisher

American Physical Society

Published Version

10.1103/PhysRevLett.110.177404

Abstract

We studied the optical properties of a strain-induced direct-band-gap Ge quantum well embedded in InGaAs. We showed that the band offsets depend on the electronegativity of the layer in contact with Ge, leading to different types of optical transitions in the heterostructure. When group-V atoms compose the interfaces, only electrons are confined in Ge, whereas both carriers are confined when the interface consists of group-III atoms. The different carrier confinement results in different emission dynamics behavior. This study provides a solution to obtain efficient light emission from Ge.

Keywords

Germanium , Band offsets , Carrier confinements , Emission dynamics , InGaAs alloys , Optical emissions , Ge quantum well

Citation

Pavarelli, N., Ochalski, T. J., Murphy-Armando, F., Huo, Y., Schmidt, M., Huyet, G. & Harris, J. S. (2013) ‘Optical Emission of a Strained Direct-Band-Gap Ge Quantum Well Embedded Inside InGaAs Alloy Layers’, Physical Review Letters, 110, 177404. http://dx.doi.org/10.1103/PhysRevLett.110.177404