In-situ examination of the selective etching of an alkanethiol monolayer covered Au{111} surface

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dc.contributor.author O'Dwyer, Colm
dc.date.accessioned 2016-07-06T15:36:26Z
dc.date.available 2016-07-06T15:36:26Z
dc.date.issued 2006-12-29
dc.identifier.citation O'Dwyer, C. (2007) 'In-situ examination of the selective etching of an alkanethiol monolayer covered Au{111} surface'. Materials Letters, 61(18), pp. 3837-3841. doi: 1016/j.matlet.2006.12.043 en
dc.identifier.volume 61 en
dc.identifier.issued 18 en
dc.identifier.startpage 3837 en
dc.identifier.endpage 3841 en
dc.identifier.issn 0167-577X
dc.identifier.issn 1873-4979
dc.identifier.uri http://hdl.handle.net/10468/2832
dc.identifier.doi 1016/j.matlet.2006.12.043
dc.description.abstract An examination of the selective etching mechanism of a 1-alkanethiol self-assembled monolayer (SAM) covered Au{111} surface using in-situ atomic force microscopy (AFM) and molecular resolution scanning tunnelling microscopy (STM) is presented. The monolayer self-assembles on a smooth Au{111} surface and typically contains nanoscale non-uniformities such as pinholes, domain boundaries and monatomic depressions. During etching in a ferri/ferrocyanide water-based etchant, selective and preferential etching occurs at SAM covered Au(111) terrace and step edges where a lower SAM packing density is observed, resulting in triangular islands being relieved. The triangular islands are commensurate with the Au(111) lattice with their long edges parallel to its [11-0] direction. Thus, SAM etching is selective and preferential attack is localized to defects and step edges at sites of high molecular density contrast. en
dc.description.sponsorship European Commission (Human Potential Programme under contract HPRN-CT-2002-00304); en
dc.format.mimetype application/pdf en
dc.language.iso en en
dc.publisher Elsevier en
dc.relation.uri http://www.sciencedirect.com/science/article/pii/S0167577X06015266
dc.rights © 2006 Elsevier B.V. This manuscript version is made available under the CC-BY-NC-ND 4.0 license en
dc.rights.uri https://creativecommons.org/licenses/by-nc-nd/4.0/ en
dc.subject Atomic force microscopy en
dc.subject Crystal lattices en
dc.subject Domain walls en
dc.subject Electrochemical etching en
dc.subject Molecular interactions en
dc.subject Self assembled monolayers en
dc.title In-situ examination of the selective etching of an alkanethiol monolayer covered Au{111} surface en
dc.type Article (peer-reviewed) en
dc.internal.authorcontactother Colm O'Dwyer, Chemistry, University College Cork, Cork, Ireland. +353-21-490-3000 Email: c.odwyer@ucc.ie en
dc.internal.availability Full text available en
dc.date.updated 2012-11-29T18:14:41Z
dc.description.version Accepted Version en
dc.internal.rssid 162343161
dc.contributor.funder Science Foundation Ireland en
dc.contributor.funder European Commission en
dc.description.status Peer reviewed en
dc.identifier.journaltitle Materials Letters en
dc.internal.copyrightchecked No. !!CORA!! Yes en
dc.internal.licenseacceptance Yes en
dc.internal.IRISemailaddress c.odwyer@ucc.ie en
dc.relation.project info:eu-repo/grantAgreement/SFI/SFI Principal Investigator Programme (PI)/02/IN.1/I172/IE/Silicon-Based Photonic Circuits Containing 2- and 3-Dimensional Photonic Crystal Waveguides and Light Sources for Communication Applications in the Visible and Near-Infrared Spectral Range/


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© 2006 Elsevier B.V. This manuscript version is made available under the CC-BY-NC-ND 4.0 license Except where otherwise noted, this item's license is described as © 2006 Elsevier B.V. This manuscript version is made available under the CC-BY-NC-ND 4.0 license
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