Ultrahigh Purcell factor in low-threshold nanolaser based on asymmetric hybrid plasmonic cavity

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dc.contributor.author Wei, Wei
dc.contributor.author Yan, Xin
dc.contributor.author Zhang, Xia
dc.date.accessioned 2016-10-10T11:55:14Z
dc.date.available 2016-10-10T11:55:14Z
dc.date.issued 2016-09-12
dc.identifier.citation WEI, W., YAN, X. and ZHANG, X. (2016), 'Ultrahigh Purcell factor in low-threshold nanolaser based on asymmetric hybrid plasmonic cavity', Scientific Reports, 6, 33063 (7pp). doi: 10.1038/srep33063 en
dc.identifier.issued 6 en
dc.identifier.startpage 1 en
dc.identifier.endpage 7 en
dc.identifier.issn 2045-2322
dc.identifier.uri http://hdl.handle.net/10468/3172
dc.identifier.doi 10.1038/srep33063
dc.description.abstract A low-threshold nanolaser with all three dimensions at the subwavelength scale is proposed and investigated. The nanolaser is constructed based on an asymmetric hybrid plasmonic F-P cavity with Ag-coated end facets. Lasing characteristics are calculated using finite element method at the wavelength of 1550 nm. The results show that owing to the low modal loss, large modal confinement factor of the asymmetric plasmonic cavity structure, in conjunction with the high reflectivity of the Ag reflectors, a minimum threshold gain of 240 cm−1 is predicted. Furthermore, the Purcell factor as large as 2518 is obtained with optimized structure parameters to enhance rates of spontaneous and stimulated emission. en
dc.description.sponsorship National Natural Science Foundation of China (Grants 61504010, 61376019 and 61511130045); European Office of Aerospace Research and Development (Grant FA9550-14-1-0204); Science Foundation Ireland (Grant 12/IP/1658); National Basic Research Program of China (Grant 2010CB327605). en
dc.format.mimetype application/pdf en
dc.language.iso en en
dc.publisher Nature Publishing Group en
dc.rights © 2016, the Authors. This work is licensed under a Creative Commons Attribution 4.0 International License. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/ en
dc.rights.uri http://creativecommons.org/licenses/by/4.0/ en
dc.subject Nanolaser en
dc.subject Asymmetric hybrid plasmonic cavity en
dc.subject Purcell factor en
dc.title Ultrahigh Purcell factor in low-threshold nanolaser based on asymmetric hybrid plasmonic cavity en
dc.type Article (peer-reviewed) en
dc.internal.authorcontactother Wei Wei, Physics, University College Cork, Cork, Ireland. +353-21-490-3000 Email: wei.wei@ucc.ie en
dc.internal.availability Full text available en
dc.description.version Published Version en
dc.contributor.funder Science Foundation Ireland en
dc.contributor.funder National Natural Science Foundation of China
dc.contributor.funder European Office of Aerospace Research and Development
dc.contributor.funder National Basic Research Program of China
dc.contributor.funder State Key Laboratory of Information Photonics and Optical Communications, China
dc.description.status Peer reviewed en
dc.identifier.journaltitle Scientific Reports en
dc.internal.IRISemailaddress wei.wei@ucc.ie
dc.identifier.articleid 33063


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© 2016, the Authors. This work is licensed under a Creative Commons Attribution 4.0 International License. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/ Except where otherwise noted, this item's license is described as © 2016, the Authors. This work is licensed under a Creative Commons Attribution 4.0 International License. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/
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