Development of nanostructured, stress-free Co-rich CoPtP films for magnetic microelectromechanical system applications

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dc.contributor.author Kulkarni, Santosh
dc.contributor.author Roy, Saibal
dc.date.accessioned 2017-07-12T09:07:45Z
dc.date.available 2017-07-12T09:07:45Z
dc.date.issued 2007-05-08
dc.identifier.citation Kulkarni, S. and Roy, S. (2007) 'Development of nanostructured, stress-free Co-rich CoPtP films for magnetic microelectromechanical system applications', Journal of Applied Physics, 101(9), pp. 09K524. doi: 10.1063/1.2712032 en
dc.identifier.volume 101
dc.identifier.issued 9
dc.identifier.startpage 1
dc.identifier.endpage 3
dc.identifier.issn 0021-8979
dc.identifier.uri http://hdl.handle.net/10468/4228
dc.identifier.doi 10.1063/1.2712032
dc.description.abstract Co-rich CoPtP alloys have been electrodeposited using direct current (dc) and pulse-reverse (PR) plating techniques. The surface morphology, crystalline structure, grain size, and magnetic properties of the plated films have been compared. The x-ray analysis and magnetic measurements reveal the presence of Co hcp hard magnetic phase with c axis perpendicular to the substrate for dc and in plane for PR plated films. The dc plated films have a granular structure in the micron scale with large cracks, which are manifestation of stress in the film. Only by using a combination of optimized PR plating conditions and stress relieving additive, we are able to produce 1-6 mu m thick (for 1 hour of plating), stress-free, and nanostructured (similar to 20 nm) Co-rich CoPtP single hcp phase at room temperature, with an intrinsic coercivity of 1500 Oe. en
dc.description.sponsorship European Commission (European Union Framework 6 STREP project VIBES (507911)) en
dc.format.mimetype application/pdf en
dc.language.iso en en
dc.publisher AIP Publishing en
dc.relation.ispartof 10th Joint Magnetism and Magnetic Materials Conference/International Magnetics Conference
dc.relation.uri http://aip.scitation.org/doi/abs/10.1063/1.2712032
dc.rights © 2007 American Institute of Physics, This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. The following article appeared in Kulkarni, S. and Roy, S. (2007) 'Development of nanostructured, stress-free Co-rich CoPtP films for magnetic microelectromechanical system applications', Journal of Applied Physics, 101(9), pp. 09K524 and may be found at http://aip.scitation.org/doi/abs/10.1063/1.2712032 en
dc.subject Pt thin-films en
dc.subject Anisotropy en
dc.subject Electrodeposition en
dc.subject Coercive force en
dc.subject Magnetic films en
dc.subject Sputter deposition en
dc.subject Microelectromechanical systems en
dc.title Development of nanostructured, stress-free Co-rich CoPtP films for magnetic microelectromechanical system applications en
dc.type Article (peer-reviewed) en
dc.internal.authorcontactother Saibal Roy, Tyndall National Institute, University College Cork, Cork, Ireland +353-21-490-3000 E-mail: saibal.roy@tyndall.ie en
dc.internal.availability Full text available en
dc.description.version Published Version en
dc.internal.rssid 259773529
dc.contributor.funder Sixth Framework Programme
dc.description.status Peer reviewed en
dc.identifier.journaltitle Journal of Applied Physics en
dc.internal.IRISemailaddress saibal.roy@tyndall.ie en
dc.identifier.articleid 09K524


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