Ultraviolet poling of pure fused silica by high-intensity femtosecond radiation

Corbari, C.; Kazansky, P. G.; Slattery, Stephen A.; Nikogosyan, David N.

Ultraviolet poling of pure fused silica by high-intensity femtosecond radiation

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Erratum

Date

2005

Authors

Corbari, C.

Kazansky, P. G.

Slattery, Stephen A.

Nikogosyan, David N.

Publisher

AIP Publishing

Published Version

10.1063/1.1868075

Abstract

We demonstrate UV poling of a pure fused silica sample by applying to it an electric field of 200 kV/cm and irradiating it with high-intensity (similar to40 GW/cm(2)) femtosecond (220 fs) laser pulses at 264 nm. (C) 2005 American Institute of Physics. (DOI:10.1063/1.1868075)

Keywords

2nd-harmonic generation , 2nd-order nonlinearity , Germanosilicate glass , Laser irradiation , Geo2-Sio2 glass , Crystals , Nm , Ultraviolet light , Silica , Electrodes , Electric fields , Laser beam effects

Citation

Corbari, C., Kazansky, P. G., Slattery, S. A. and Nikogosyan, D. N. (2005) 'Ultraviolet poling of pure fused silica by high-intensity femtosecond radiation', Applied Physics Letters, 86(7), pp. 071106. doi: 10.1063/1.1868075

Copyright

© 2005 American Institute of Physics.This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. The following article appeared in Corbari, C., Kazansky, P. G., Slattery, S. A. and Nikogosyan, D. N. (2005) 'Ultraviolet poling of pure fused silica by high-intensity femtosecond radiation', Applied Physics Letters, 86(7), pp. 071106 and may be found at http://aip.scitation.org/doi/abs/10.1063/1.1868075

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