Co-based amorphous thin films on silicon with soft magnetic properties

Masood, Ansar; McCloskey, Paul; Ó Mathúna, S. Cian; Kulkarni, Santosh

Co-based amorphous thin films on silicon with soft magnetic properties

Files

4478.pdf(3.72 MB)

Published Version

Date

2017

Authors

Masood, Ansar

McCloskey, Paul

Ó Mathúna, S. Cian

Kulkarni, Santosh

Publisher

AIP Publishing

Published Version

10.1063/1.5007733

Abstract

The present work investigates the emergence of multiple modes in the high-frequency permeability spectrum of Co-Zr-Ta-B amorphous thin films. Amorphous thin films of different thicknesses (t=100-530 nm) were deposited by DC magnetron sputtering. Their static and dynamic soft magnetic properties were investigated to explore the presence of multi-magnetic phases in the films. A two-phase magnetic behavior of the thicker films (≥333 nm) was revealed by the in-plane hysteresis loops. Multiple resonance peaks were observed in the high-frequency permeability spectrum of the thicker films. The thickness dependent multiple resonance peaks below the main ferromagnetic resonance (FMR) can be attributed to the two-phase magnetic behaviors of the films.

Keywords

Condensed matter properties , Thin films , Magnetic materials , Ferromagnetic resonance , Physical vapor deposition

Citation

Masood, A., McCloskey, P., Mathúna, C. Ó. and Kulkarni, S. (2018) 'Co-based amorphous thin films on silicon with soft magnetic properties', AIP Advances, 8(5), 056109(6pp). doi: 10.1063/1.5007733