Block copolymer self-assembly: ordered film formation and defect analysis
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Date
2017
Authors
Collins, Timothy W.
Journal Title
Journal ISSN
Volume Title
Publisher
University College Cork
Published Version
Abstract
The self-assembly of block copolymers (BCPs) is a promising strategy for the creation of nanoscale structures for use in a wide range of applications. In particular, as conventional photolithographic methods of fabricating nanoelectronics approach their physical limitations, BCPs offer a route to continue scaling down feature size. This thesis investigated the ability of BCPs in thin film to form well-ordered patterns in the nanometre range using a series of polystyrene-block-poly(ethylene oxide) (PS-b-PEO), polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) and polystyrene-block-poly(2-vinylpyridine) (PS-b-P2VP) for lithographic applications. A novel application for the analysis of BCP patterns is detailed, as a tool for the further optimisation of microphase separation techniques.
Description
Keywords
Nanotechnology , Materials science , Block copolymers , Semiconductors , Nanopatterns
Citation
Collins, T. W. 2017. Block copolymer self-assembly: ordered film formation and defect analysis. PhD Thesis, University College Cork.