Self-seeded growth of germanium nanowires: coalescence and ostwald ripening

Loading...
Thumbnail Image
Files
Lotty_et_al_(Manuscript).pdf(5.65 MB)
Accepted version
Date
2012-12-20
Authors
Lotty, Olan
Hobbs, Richard
O'Regan, Colm
Hlina, Johann
Marschner, Christoph
O'Dwyer, Colm
Petkov, Nikolay
Holmes, Justin D.
Journal Title
Journal ISSN
Volume Title
Publisher
American Chemical Society (ACS)
Published Version
Research Projects
Organizational Units
Journal Issue
Abstract
We report the controlled self-seeded growth of highly crystalline Ge nanowires, in the absence of conventional metal seed catalysts, using a variety of oligosilylgermane precursors and mixtures of germane and silane compounds (Ge:Si ratios between 1:4 and 1:1). The nanowires produced were encased in an amorphous shell of material derived from the precursors, which acted to isolate the Ge seed particles from which the nanowires were nucleated. The mode diameter and size distribution of the nanowires were found to increase as the growth temperature and Ge content in the precursors increased. Specifically, a model was developed to describe the main stages of self-seeded Ge nanowire growth (nucleation, coalescence, and Ostwald ripening) from the oligosilylgermane precursors and, in conjunction with TEM analysis, a mechanism of growth was proposed.
Description
Keywords
Germanium , Nanowires , Self-seeded , Coalescence , Ostwald ripening
Citation
Lotty, O., Hobbs, R., O’Regan, C., Hlina, J., Marschner, C., O’Dwyer, C., Petkov, N. and Holmes, J. D. (2013) 'Self-Seeded Growth of Germanium Nanowires: Coalescence and Ostwald Ripening', Chemistry of Materials, 25(2), pp. 215-222. doi: 10.1021/cm3032863
Copyright
© 2012 American Chemical Society. This document is the Accepted Manuscript version of a Published Work that appeared in final form in Chemistry of Materials, copyright © American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see https://pubs.acs.org/doi/10.1021/cm3032863