Metallophosphazene precursor routes to the solid-state deposition of metallic and dielectric microstructures and nanostructures on Si and SiO2
Loading...
Files
Accepted version
Date
2010-04-09
Authors
Díaz, Carlos
Valenzuela, María Luisa
Laguna, Antonio
Lavayen, Vladimir
Jimenez, Josefina
Power, Lynn A.
O'Dwyer, Colm
Journal Title
Journal ISSN
Volume Title
Publisher
American Chemical Society (ACS)
Published Version
Abstract
We present a method for the preparation and deposition of metallic microstructures and nanostructures deposited on silicon and silica surfaces by pyrolysis in air at 800 °C of the corresponding metallophosphazene (cyclic or polymer). Atomic force microscopy studies reveal that the morphology is dependent on the polymeric or oligomeric nature of the phosphazene precursor, on the preparation method used, and on the silicon substrate surface (crystalline or amorphous) and its prior inductively couple plasma etching treatment. Microscale and nanoscale structures and high-surface-area thin films of gold, palladium, silver, and tin were successfully deposited from their respective newly synthesized precursors. The characteristic morphology of the deposited nanostructures resulted in varied roughness and increased surface area and was observed to be dependent on the precursor and the metal center. In contrast to island formation from noble metal precursors, we also report a coral of SnP2O7 growth on Si and SiO2 surfaces from the respective Sn polymer precursor, leaving a self-affine fractal structure with a well-defined roughness exponent that appears to be independent (within experimental error) of the average size of the islands. The nature of the precursor will be shown to influence the degree of surface features, and the mechanism of their formation is presented. The method reported here constitutes a new route to the deposition of single-crystal metallic, oxidic, and phosphate nanostructures and thin films on technologically relevant substrates.
Description
Keywords
Amorphous silicon , Atomic force microscopy , Deposition , Film preparation , Gold coatings , Gold deposits , Microstructure , Morphology , Nanostructures , Oligomers , Palladium , Plasma etching , Polymers , Precious metals , Pyrolysis , Silica , Silicon oxides , Silver , Substrates , Surface roughness , Thin films , Tin , Vapor deposition
Citation
Díaz, C., Valenzuela, M. L., Laguna, A., Lavayen, V., Jiménez, J., Power, L. A. and O’Dwyer, C. (2010) 'Metallophosphazene Precursor Routes to the Solid-State Deposition of Metallic and Dielectric Microstructures and Nanostructures on Si and SiO2', Langmuir, 26(12), pp. 10223-10233. doi: 10.1021/la100371w
Link to publisher’s version
Copyright
© 2010 American Chemical Society. This document is the Accepted Manuscript version of a Published Work that appeared in final form in Langmuir, copyright © American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see https://pubs.acs.org/doi/abs/10.1021/la100371w