Metallophosphazene precursor routes to the solid-state deposition of metallic and dielectric microstructures and nanostructures on Si and SiO2

Show simple item record

dc.contributor.author Díaz, Carlos
dc.contributor.author Valenzuela, María Luisa
dc.contributor.author Laguna, Antonio
dc.contributor.author Lavayen, Vladimir
dc.contributor.author Jimenez, Josefina
dc.contributor.author Power, Lynn A.
dc.contributor.author O'Dwyer, Colm
dc.date.accessioned 2018-06-13T15:25:07Z
dc.date.available 2018-06-13T15:25:07Z
dc.date.issued 2010-04-09
dc.identifier.citation Díaz, C., Valenzuela, M. L., Laguna, A., Lavayen, V., Jiménez, J., Power, L. A. and O’Dwyer, C. (2010) 'Metallophosphazene Precursor Routes to the Solid-State Deposition of Metallic and Dielectric Microstructures and Nanostructures on Si and SiO2', Langmuir, 26(12), pp. 10223-10233. doi: 10.1021/la100371w en
dc.identifier.volume 26 en
dc.identifier.startpage 10223 en
dc.identifier.endpage 10233 en
dc.identifier.issn 0743-7463
dc.identifier.uri http://hdl.handle.net/10468/6297
dc.identifier.doi 10.1021/la100371w
dc.description.abstract We present a method for the preparation and deposition of metallic microstructures and nanostructures deposited on silicon and silica surfaces by pyrolysis in air at 800 °C of the corresponding metallophosphazene (cyclic or polymer). Atomic force microscopy studies reveal that the morphology is dependent on the polymeric or oligomeric nature of the phosphazene precursor, on the preparation method used, and on the silicon substrate surface (crystalline or amorphous) and its prior inductively couple plasma etching treatment. Microscale and nanoscale structures and high-surface-area thin films of gold, palladium, silver, and tin were successfully deposited from their respective newly synthesized precursors. The characteristic morphology of the deposited nanostructures resulted in varied roughness and increased surface area and was observed to be dependent on the precursor and the metal center. In contrast to island formation from noble metal precursors, we also report a coral of SnP2O7 growth on Si and SiO2 surfaces from the respective Sn polymer precursor, leaving a self-affine fractal structure with a well-defined roughness exponent that appears to be independent (within experimental error) of the average size of the islands. The nature of the precursor will be shown to influence the degree of surface features, and the mechanism of their formation is presented. The method reported here constitutes a new route to the deposition of single-crystal metallic, oxidic, and phosphate nanostructures and thin films on technologically relevant substrates. en
dc.description.sponsorship Fondo Nacional de Desarrollo Científico, Tecnológico y de Innovación Tecnológica (FONDECYT project 1085011); Higher Education Authority (under the framework of the INSPIRE programme, funded by the Irish Government’s Programme for Research in Third Level Institutions, Cycle 4, National Development Plan 2007-2013); Ministerio de Educación, Cultura y Deporte (Spanish Ministerio de Educacion y Ciencia (CTQ2007-67273-C02-01)); en
dc.format.mimetype application/pdf en
dc.language.iso en en
dc.publisher American Chemical Society (ACS) en
dc.rights © 2010 American Chemical Society. This document is the Accepted Manuscript version of a Published Work that appeared in final form in Langmuir, copyright © American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see https://pubs.acs.org/doi/abs/10.1021/la100371w en
dc.subject Amorphous silicon en
dc.subject Atomic force microscopy en
dc.subject Deposition en
dc.subject Film preparation en
dc.subject Gold coatings en
dc.subject Gold deposits en
dc.subject Microstructure en
dc.subject Morphology en
dc.subject Nanostructures en
dc.subject Oligomers en
dc.subject Palladium en
dc.subject Plasma etching en
dc.subject Polymers en
dc.subject Precious metals en
dc.subject Pyrolysis en
dc.subject Silica en
dc.subject Silicon oxides en
dc.subject Silver en
dc.subject Substrates en
dc.subject Surface roughness en
dc.subject Thin films en
dc.subject Tin en
dc.subject Vapor deposition en
dc.title Metallophosphazene precursor routes to the solid-state deposition of metallic and dielectric microstructures and nanostructures on Si and SiO2 en
dc.type Article (peer-reviewed) en
dc.internal.authorcontactother Colm O'Dwyer, Chemistry, University College Cork, Cork, Ireland. +353-21-490-3000 Email: c.odwyer@ucc.ie en
dc.internal.availability Full text available en
dc.date.updated 2018-06-11T09:31:34Z
dc.description.version Accepted Version en
dc.internal.rssid 162343113
dc.contributor.funder Fondo Nacional de Desarrollo Científico, Tecnológico y de Innovación Tecnológica en
dc.contributor.funder Higher Education Authority en
dc.contributor.funder Ministerio de Educación, Cultura y Deporte en
dc.contributor.funder Gobierno de Aragón en
dc.description.status Peer reviewed en
dc.identifier.journaltitle Langmuir en
dc.internal.copyrightchecked Yes en
dc.internal.licenseacceptance Yes en
dc.internal.IRISemailaddress c.odwyer@ucc.ie en


Files in this item

This item appears in the following Collection(s)

Show simple item record

This website uses cookies. By using this website, you consent to the use of cookies in accordance with the UCC Privacy and Cookies Statement. For more information about cookies and how you can disable them, visit our Privacy and Cookies statement