Proximal oxidation as a director of self organisation

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dc.contributor.author Fois, Giovanni
dc.contributor.author Bolger, Ciara T.
dc.contributor.author Holmes, Justin D.
dc.contributor.author Cross, Graham L. W.
dc.date.accessioned 2018-08-31T11:37:39Z
dc.date.available 2018-08-31T11:37:39Z
dc.date.issued 2011-06
dc.identifier.citation Fois, G., Bolger, C. T., Holmes, J. D. and Cross, G. L. W. (2011) 'Proximal oxidation as a director of self-organisation', Journal of Materials Chemistry, 21(24), pp. 8772-8780. doi: 10.1039/C0JM04352D en
dc.identifier.volume 21 en
dc.identifier.startpage 8772 en
dc.identifier.endpage 8780 en
dc.identifier.issn 0959-9428
dc.identifier.uri http://hdl.handle.net/10468/6695
dc.identifier.doi 10.1039/C0JM04352D
dc.description.abstract Self-organising templates used as etch masks and growth seeds enable efficient mass fabrication of nanoscale device layers. In this work we introduce a new way to direct self-organisation of nanoscale pore formation during anodisation of metal layers of direct relevance to nanofabrication process flows. We demonstrate and quantitatively characterise how proximal surface oxidation frustrates and redirects random pore ordering in the film. Our results show a strict correlation between pore formation and oxide thickness on the aluminium surface providing important information on pore nucleation and growth in substrate-supported thin films and confirming the predictions of several existing theoretical models on pore growth. We find a linear relation between applied voltage and intrinsic self-organising interpore distance for supported thin films (from 80 to 150 nm) over a wide potential window between 40 and 120 V, mirroring behavior of thicker unsupported foils but with a different coefficient of proportionality. Using this technique, we are able to produce arbitrary and highly regular patterns of pores while manipulating pore pitch up to 20% from the natural spacing. This work demonstrates for the first time how local oxidation can direct self-organisation. en
dc.description.sponsorship Irish Research Council for Science Engineering and Technology (IRCSET studentship); Higher Education Authority (HEA Program for Research in Third Level Institutions (2007–2011) via the INSPIRE program) en
dc.format.mimetype application/pdf en
dc.language.iso en en
dc.publisher Royal Society of Chemistry (RSC) en
dc.relation.uri http://pubs.rsc.org/en/content/articlelanding/2011/jm/c0jm04352d
dc.rights © Royal Society of Chemistry 2011 en
dc.subject Oxidation en
dc.subject Nanostructured materials en
dc.subject Nanotechnology en
dc.subject Oxide films en
dc.subject Pore size en
dc.subject Thin films en
dc.subject Aluminium surface en
dc.subject Anodisation en
dc.subject Applied voltages en
dc.subject Etch mask en
dc.subject Interpore distances en
dc.subject Linear relation en
dc.subject Local oxidation en
dc.subject Mass fabrication en
dc.subject Metal layer en
dc.subject Nano-scale pores en
dc.subject Nanofabrication process en
dc.subject Nanoscale device en
dc.subject Oxide thickness en
dc.subject Pore formation en
dc.subject Pore growth en
dc.subject Pore nucleation en
dc.subject Pore ordering en
dc.subject Potential windows en
dc.subject Regular patterns en
dc.subject Self-organisation en
dc.subject Self-organising en
dc.subject Surface oxidations en
dc.subject Theoretical models en
dc.title Proximal oxidation as a director of self organisation en
dc.type Article (peer-reviewed) en
dc.internal.authorcontactother Justin D. Holmes, Chemistry, University College Cork, Cork, Ireland. +353-21-490-3000 Email: j.holmes@ucc.ie en
dc.internal.availability Full text available en
dc.date.updated 2018-08-06T15:03:53Z
dc.description.version Accepted Version en
dc.internal.rssid 88831078
dc.contributor.funder Science Foundation Ireland en
dc.contributor.funder Irish Research Council for Science, Engineering and Technology en
dc.contributor.funder Higher Education Authority en
dc.description.status Peer reviewed en
dc.identifier.journaltitle Journal of Materials Chemistry en
dc.internal.copyrightchecked No !!CORA!! en
dc.internal.licenseacceptance Yes en
dc.internal.IRISemailaddress j.holmes@ucc.ie en
dc.relation.project info:eu-repo/grantAgreement/SFI/SFI Centre for Science Engineering and Technology (CSET)/08/CE/I1432/IE/CSET CRANN: 2nd Term funding/ en


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