Morphological evolution of lamellar forming polystyrene-block-poly(4-vinylpyridine) copolymer under solvent annealing

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dc.contributor.author Ghoshal, Tandra
dc.contributor.author Chaudhari, Atul
dc.contributor.author Cummins, Cian
dc.contributor.author Shaw, Matthew T.
dc.contributor.author Holmes, Justin D.
dc.contributor.author Morris, Michael A.
dc.date.accessioned 2018-09-12T09:22:02Z
dc.date.available 2018-09-12T09:22:02Z
dc.date.issued 2016-05-17
dc.identifier.citation Ghoshal, T., Chaudhari, A., Cummins, C., Shaw, M. T., Holmes, J. D. and Morris, M. A. (2016) 'Morphological evolution of lamellar forming polystyrene-block-poly(4-vinylpyridine) copolymers under solvent annealing', Soft Matter, 12(24), pp. 5429-5437. doi: 10.1039/c6sm00815a en
dc.identifier.volume 12 en
dc.identifier.issued 24 en
dc.identifier.startpage 5429 en
dc.identifier.endpage 5437 en
dc.identifier.uri http://hdl.handle.net/10468/6754
dc.identifier.doi 10.1039/c6sm00815a
dc.description.abstract In this work, we are reporting a very simple and efficient method to form lamellar structures of symmetric polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP) copolymer thin films with vertically (to the surface plane) orientated lamellae using a solvent annealing approach. The methodology does not require any brush chemistry to engineer a neutral surface and it is the block neutral nature of the film-solvent vapour interface that defines the orientation of the lamellae. The microphase separated structure of two different molecular weight lamellar forming PS-block-P4VP copolymers formed under solvent vapour annealing was monitored using atomic force microscopy (AFM) so as to understand the morphological changes of the films upon different solvent exposure. In particular, the morphology changes from micellar structures to well-defined microphase separated arrangements. The choice of solvent/s (single and dual solvent exposure) and the solvent annealing conditions (temperature, time etc.) has important effects on structural transitions of the films and it was found that a block neutral solvent was required to realize vertically aligned P4VP lamellae. The results of the structural variation of the phase separated nanostructured films through the exposure to ethanol are also described. en
dc.description.sponsorship Science Foundation Ireland through Semiconductor Research Corporation (2013-OJ-2444 grant) en
dc.format.mimetype application/pdf en
dc.language.iso en en
dc.publisher Royal Society of Chemistry (RSC) en
dc.relation.uri http://pubs.rsc.org/en/journals/journalissues/sm#!recentarticles&adv
dc.rights © The Royal Society of Chemistry 2016 en
dc.subject Lamellar structures en
dc.subject Annealing en
dc.subject Atomic force microscopy en
dc.subject Interfaces (materials) en
dc.subject Polystyrenes en
dc.subject Separation en
dc.subject Solvents en
dc.subject Thin films en
dc.subject Copolymer thin films en
dc.subject Microphase separated en
dc.subject Microphase-separated structure en
dc.subject Morphological changes en
dc.subject Morphological evolution en
dc.subject Poly(4-vinyl pyridine) en
dc.subject Structural transitions en
dc.subject Structural variations en
dc.title Morphological evolution of lamellar forming polystyrene-block-poly(4-vinylpyridine) copolymer under solvent annealing en
dc.type Article (peer-reviewed) en
dc.internal.authorcontactother Justin D. Holmes, Chemistry, University College Cork, Cork, Ireland. +353-21-490-3000 Email: j.holmes@ucc.ie en
dc.internal.availability Full text available en
dc.date.updated 2018-08-07T12:46:51Z
dc.description.version Accepted Version en
dc.internal.rssid 355156668
dc.contributor.funder Science Foundation Ireland en
dc.contributor.funder Semiconductor Research Corporation en
dc.description.status Peer reviewed en
dc.identifier.journaltitle Soft Matter en
dc.internal.copyrightchecked No !!CORA!! en
dc.internal.licenseacceptance Yes en
dc.internal.IRISemailaddress j.holmes@ucc.ie en
dc.relation.project info:eu-repo/grantAgreement/SFI/SFI Starting Investigator Research Grant (SIRG)/09/SIRG/I1621/IE/Tuning surface and dopant properties of silicon and germanium nanowires for high performance nanowire-based field-effect transistors/ en
dc.relation.project info:eu-repo/grantAgreement/SFI/SFI Research Centres/12/RC/2278/IE/Advanced Materials and BioEngineering Research Centre (AMBER)/ en


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