Solvent vapor annealing of block copolymers in confined topographies: commensurability considerations for nanolithography

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dc.contributor.author Cummins, Cian
dc.contributor.author Kelly, Róisín A.
dc.contributor.author Gangnaik, Anushka S.
dc.contributor.author Georgiev, Yordan M.
dc.contributor.author Petkov, Nikolay
dc.contributor.author Holmes, Justin D.
dc.contributor.author Morris, Michael A.
dc.date.accessioned 2018-09-14T13:50:53Z
dc.date.available 2018-09-14T13:50:53Z
dc.date.issued 2015-02-19
dc.identifier.citation Cummins, C., Kelly, R. A., Gangnaik, A., Georgiev, Y. M., Petkov, N., Holmes, J. D. and Morris, M. A. (2015) 'Solvent Vapor Annealing of Block Copolymers in Confined Topographies: Commensurability Considerations for Nanolithography', Macromolecular Rapid Communications, 36(8), pp. 762-767. doi: 10.1002/marc.201400722 en
dc.identifier.volume 36 en
dc.identifier.issued 8 en
dc.identifier.startpage 762 en
dc.identifier.endpage 767 en
dc.identifier.issn 1022-1336
dc.identifier.uri http://hdl.handle.net/10468/6791
dc.identifier.doi 10.1002/marc.201400722
dc.description.abstract The directed self-assembly of block copolymer (BCP) materials in topographically patterned substrates (i.e., graphoepitaxy) is a potential methodology for the continued scaling of nanoelectronic device technologies. In this Communication, an unusual feature size variation in BCP nanodomains under confi nement with graphoepitaxially aligned cylinder-forming poly(styrene)- block -poly(4-vinylpyridine) (PS- b -P4VP) BCP is reported. Graphoepitaxy of PS- b -P4VP BCP line patterns (C II ) is accomplished via topography in hydrogen silsequioxane (HSQ) modified substrates and solvent vapor annealing (SVA). Interestingly, reduced domain sizes in features close to the HSQ guiding features are observed. The feature size reduction is evident after inclusion of alumina into the P4VP domains followed by pattern transfer to the silicon substrate. It is suggested that this nanodomain size perturbation is due to solvent swelling effects during SVA. It is proposed that using a commensurability value close to the solvent vapor annealed periodicity will alleviate this issue leading to uniform nanofins. en
dc.description.sponsorship Science Foundation Ireland (SFI 09/IN.1/602) en
dc.format.mimetype application/pdf en
dc.language.iso en en
dc.publisher Wiley
dc.relation.uri https://onlinelibrary.wiley.com/doi/abs/10.1002/marc.201400722
dc.rights © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. This is the peer reviewed version of the following article: (2015), Solvent Vapor Annealing of Block Copolymers in Confined Topographies: Commensurability Considerations for Nanolithography. Macromol. Rapid Commun., 36: 762-767, which has been published in final form at https://doi.org/10.1002/marc.201400722. This article may be used for non-commercial purposes in accordance with Wiley Terms and Conditions for Self-Archiving. en
dc.subject Block copolymers en
dc.subject Commensurability en
dc.subject Directed self‐assembly en
dc.subject Graphoepitaxy en
dc.subject Pattern transfer en
dc.subject Solvent vapor annealing en
dc.title Solvent vapor annealing of block copolymers in confined topographies: commensurability considerations for nanolithography en
dc.type Article (peer-reviewed) en
dc.internal.authorcontactother Justin D. Holmes, Chemistry, University College Cork, Cork, Ireland. +353-21-490-3000 Email: j.holmes@ucc.ie en
dc.internal.availability Full text available en
dc.date.updated 2018-08-08T10:18:48Z
dc.description.version Accepted Version en
dc.internal.rssid 299671408
dc.contributor.funder Science Foundation Ireland en
dc.description.status Peer reviewed en
dc.identifier.journaltitle Macromolecular Rapid Communications en
dc.internal.copyrightchecked No !!CORA!! en
dc.internal.licenseacceptance Yes en
dc.internal.IRISemailaddress j.holmes@ucc.ie en
dc.relation.project info:eu-repo/grantAgreement/SFI/SFI Centre for Science Engineering and Technology (CSET)/02/CE.1/I142/IE/CSET CRANN: Centre for Research on Adaptive Nanostructures and Nanodevices/ en


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