Cyclical 'flipping' of morphology in block copolymer films

Show simple item record Mokarian-Tabari, Parvaneh Collins, Timothy W. Holmes, Justin D. Morris, Michael A. 2018-09-18T15:22:38Z 2018-09-18T15:22:38Z 2011-05-26
dc.identifier.citation Mokarian-Tabari, P., Collins, T. W., Holmes, J. D. and Morris, M. A. (2011) 'Cyclical “Flipping” of Morphology in Block Copolymer Thin Films', ACS Nano, 5(6), pp. 4617-4623. doi: 10.1021/nn2003629 en
dc.identifier.volume 5 en
dc.identifier.startpage 4617 en
dc.identifier.endpage 4623 en
dc.identifier.issn 1936-0851
dc.identifier.doi 10.1021/nn2003629
dc.description.abstract We studied the kinetics of nanopattern evolution in (polystyrene-b-polyethylene oxide) diblock copolymer thin films. Using scanning force microscopy, a highly unexpected cylindrical flipping of morphology from normal to parallel to the film plane was detected during solvent annealing of the film (with average thickness of 30 nm) at high vapor pressure. Using an in situ time-resolved light scattering device combined with an environmental cell enabled us to obtain kinetic information at different vapor pressures. The data indicated that there is a threshold value for the vapor pressure necessary for the structural transition. We propose a swelling and deswelling mechanism for the orientation flipping of the morphology. The cyclic transition occurs faster in thick films (177 nm) where the mass uptake and solvent volume fraction is smaller and therefore the driving force for phase separation is higher. We induced a stronger segregation by confining the chains in graphoepitaxially patterned substrates. As expected, the cyclic transition occurred at higher rate. Our work is another step forward to understanding the structure evolution and also controlling the alignment of block copolymer nanocylinders independently of thickness and external fields. en
dc.format.mimetype application/pdf en
dc.language.iso en en
dc.publisher American Chemical Society (ACS) en
dc.rights © 2011 American Chemical Society. This document is the Accepted Manuscript version of a Published Work that appeared in final form in ACS Nano, copyright © American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see en
dc.subject Block copolymer thin films en
dc.subject Cyclical morphology transition en
dc.subject Graphoepitaxial alignment en
dc.subject In-situ light scattering en
dc.subject Nanopattern evolution en
dc.title Cyclical 'flipping' of morphology in block copolymer films en
dc.type Article (peer-reviewed) en
dc.internal.authorcontactother Justin D. Holmes, Chemistry, University College Cork, Cork, Ireland. +353-21-490-3000 Email: en
dc.internal.availability Full text available en 2018-08-06T14:49:00Z
dc.description.version Accepted Version en
dc.internal.rssid 95057125
dc.description.status Peer reviewed en
dc.identifier.journaltitle Acs Nano en
dc.internal.copyrightchecked No !!CORA!! en
dc.internal.licenseacceptance Yes en
dc.internal.IRISemailaddress en
dc.relation.project info:eu-repo/grantAgreement/SFI/SFI Centre for Science Engineering and Technology (CSET)/03/CE3/M407B/IE/CSET CRANN: Construction of Specialised Laboratory for Nanoscience Research - CRANN/ en

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