Surface-directed dewetting of a block copolymer for fabricating highly uniform nanostructured microdroplets and concentric nanorings

Show simple item record Farrell, Richard A. Kehagias, Nikolaos Shaw, Matthew T. Reboud, Vincent Zelsmann, Marc Holmes, Justin D. Sotomayor Torres, Clivia M. Morris, Michael A. 2018-09-19T09:24:51Z 2018-09-19T09:24:51Z 2011-01-12
dc.identifier.citation Farrell, R. A., Kehagias, N., Shaw, M. T., Reboud, V., Zelsmann, M., Holmes, J. D., Sotomayor Torres, C. M. and Morris, M. A. (2011) 'Surface-Directed Dewetting of a Block Copolymer for Fabricating Highly Uniform Nanostructured Microdroplets and Concentric Nanorings', ACS Nano, 5(2), pp. 1073-1085. doi: 10.1021/nn102720m en
dc.identifier.volume 5 en
dc.identifier.startpage 1073 en
dc.identifier.endpage 1085 en
dc.identifier.issn 1936-0851
dc.identifier.doi 10.1021/nn102720m
dc.description.abstract Through a combination of nanoimprint lithography and block copolymer self-assembly, a highly regular dewetting process of a symmetric diblock copolymer occurs whereby the hierarchal formation of microdroplets and concentric nanorings emerges. The process is driven by the unique chemical properties and geometrical layout of the underlying patterned silsesquioxane micrometer-sized templates. Given the presence of nonpreferential substrate−polymer interactions, directed dewetting was utilized to produce uniform arrays of microsized droplets of microphase separated polystyrene-block-poly(methyl methylacrylate) (PS-b-PMMA), following thermal annealing at 180 °C. Microdroplets with diameters greater than 400 nm exhibited a hexagonal close-packed arrangement of nanodots on the surface with polydomain ordering. At the droplet periphery, the polydomain ordering was severely disrupted because of a higher in-plane radius of curvature. By reducing the droplet size, the in-plane radius of curvature of the microdroplet becomes significant and the PMMA cylinders adopt parallel structures in this confined geometry. Continuous scaling of the droplet results in the generation of isolated, freestanding, self-aligned, and self-supported oblique nanorings (long axis ∼250−350 nm), which form as interstitial droplets between the larger microdroplets. Optical and magnetic-based nanostructures may benefit from such hierarchal organization and self-supporting/aligned nanoring templates by combining more than one lithography technique with different resolution capabilities. en
dc.format.mimetype application/pdf en
dc.language.iso en en
dc.publisher American Chemical Society (ACS) en
dc.rights © 2011 American Chemical Society. This document is the Accepted Manuscript version of a Published Work that appeared in final form in ACS Nano, copyright © American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see en
dc.subject Block copolymers en
dc.subject Directed dewetting en
dc.subject Graphoepitaxy en
dc.subject Microdroplet en
dc.subject Nanoimprint en
dc.subject Lithography en
dc.subject Nanoring en
dc.subject Polystyrene-block-poly(methyl methylacrylate) en
dc.subject Silsesquioxane en
dc.title Surface-directed dewetting of a block copolymer for fabricating highly uniform nanostructured microdroplets and concentric nanorings en
dc.type Article (peer-reviewed) en
dc.internal.authorcontactother Justin D. Holmes, Chemistry, University College Cork, Cork, Ireland. +353-21-490-3000 Email: en
dc.internal.availability Full text available en 2018-08-06T15:10:28Z
dc.description.version Accepted Version en
dc.internal.rssid 69520758
dc.contributor.funder Science Foundation Ireland en
dc.contributor.funder Seventh Framework Programme en
dc.description.status Peer reviewed en
dc.identifier.journaltitle ACS Nano en
dc.internal.copyrightchecked No !!CORA!! en
dc.internal.licenseacceptance Yes en
dc.internal.IRISemailaddress en
dc.relation.project info:eu-repo/grantAgreement/SFI/SFI Principal Investigator Programme (PI)/03/IN.3/I375/IE/The assembly of electronically important materials as structurally and size controlled nanowires into 3-dimensional architectures and construction of Prototype circuitry there from./ en
dc.relation.project info:eu-repo/grantAgreement/SFI/SFI Centre for Science Engineering and Technology (CSET)/03/CE3/M406/IE/CSET CRANN: Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN)/ en
dc.relation.project info:eu-repo/grantAgreement/EC/FP7::SP1::NMP/214249/EU/Nanopatterning, Production and Applications based on Nanoimprinting Lithography/NAPANIL en

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