Palladium activated self-assembled monolayer for magnetics on silicon applications

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dc.contributor.author Anthony, Ricky
dc.contributor.author Ó Mathúna, S. Cian
dc.contributor.author Rohan, James F.
dc.date.accessioned 2019-03-11T11:52:54Z
dc.date.available 2019-03-11T11:52:54Z
dc.date.issued 2015-12-29
dc.identifier.citation Anthony, R., Ó Mathúna, C. and Rohan, J. F. (2015) 'Palladium Activated Self-Assembled Monolayer for Magnetics on Silicon Applications', Physics Procedia, 75, pp. 1207-1213. doi: 10.1016/j.phpro.2015.12.122 en
dc.identifier.volume 75 en
dc.identifier.startpage 1207 en
dc.identifier.endpage 1213 en
dc.identifier.issn 1875-3892
dc.identifier.uri http://hdl.handle.net/10468/7591
dc.identifier.doi 10.1016/j.phpro.2015.12.122
dc.description.abstract Magnetic thin films such as Permalloy (Py) have been extensively used as core material in integrated power magnetic components (micro-inductors and transformers) for their excellent soft magnetic properties. Existing core electrodeposition technology requires sputtered permalloy seed layer. This seed layer etches slowly compared to the electroplated core during magnetic core patterning. In this work, a new electroless deposition process has been developed where samples are activated by palladium to realize a thin catalytic layer on SiO2. Up to 1 μm thick permalloy (∼22% ±3% Fe and ∼78%±3% Ni) is deposited from an in-house developed borane based bath to achieve ∼ 30-35 μOhm-cm resistivities. The magnetic properties of permalloy deposits reveal distinct hysteresis loop with coercivity (∼4.5 Oe). The electroless permalloy over-etch (12 μm) compared with sputtered permalloy seed is found to be negligible (2 μm). This demonstrates the applicability of permalloy electroless deposition as a seed for high yield batch fabrication of magnetics on silicon devices. en
dc.format.mimetype application/pdf en
dc.language.iso en en
dc.publisher Elsevier en
dc.relation.uri http://www.sciencedirect.com/science/article/pii/S1875389215017617
dc.rights © 2015 The Authors. Published by Elsevier B.V. Under a Creative Commons license en
dc.rights.uri http://creativecommons.org/licenses/by-nc-nd/4.0/ en
dc.subject Electroless deposition en
dc.subject Integrated inductors en
dc.subject Magnetics on Silicon en
dc.subject Over-etch en
dc.subject Self-assembled monolayers en
dc.title Palladium activated self-assembled monolayer for magnetics on silicon applications en
dc.type Article (peer-reviewed) en
dc.internal.authorcontactother James Rohan, Tyndall Microsystems, University College Cork, Cork, Ireland. +353-21-490-3000 Email: james.rohan@tyndall.ie en
dc.internal.availability Full text available en
dc.date.updated 2019-03-11T11:47:04Z
dc.description.version Published Version en
dc.internal.rssid 477109492
dc.internal.rssid 477477055
dc.contributor.funder Seventh Framework Programme en
dc.description.status Peer reviewed en
dc.identifier.journaltitle Physics Procedia en
dc.internal.copyrightchecked No !!CORA!! en
dc.internal.licenseacceptance Yes en
dc.internal.IRISemailaddress james.rohan@tyndall.ie en
dc.internal.IRISemailaddress cian.omathuna@ucc.ie en
dc.relation.project info:eu-repo/grantAgreement/EC/FP7::SP1::ICT/318529/EU/POWER SoC With Integrated PassivEs/POWERSWIPE en


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© 2015 The Authors. Published by Elsevier B.V. Under a Creative Commons license Except where otherwise noted, this item's license is described as © 2015 The Authors. Published by Elsevier B.V. Under a Creative Commons license
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