Solvent mediated inclusion of metal oxide into block copolymer nanopatterns: mechanism of oxide formation under UV-Ozone treatment

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dc.contributor.author Ghoshal, Tandra
dc.contributor.author O'Connell, John
dc.contributor.author Sinturel, Christophe
dc.contributor.author Andreazza, Pascal
dc.contributor.author Holmes, Justin D.
dc.contributor.author Morris, Michael A.
dc.date.accessioned 2019-06-21T11:56:01Z
dc.date.available 2019-06-21T11:56:01Z
dc.date.issued 2019-04-20
dc.identifier.citation Ghoshal, T., O'Connell, J., Sinturel, C., Andreazza, P., Holmes, J. D. and Morris, M. A. (2019) 'Solvent mediated inclusion of metal oxide into block copolymer nanopatterns: Mechanism of oxide formation under UV-Ozone treatment', Polymer, 173, pp. 197-204. doi: 10.1016/j.polymer.2019.04.043 en
dc.identifier.volume 173 en
dc.identifier.startpage 197 en
dc.identifier.endpage 204 en
dc.identifier.issn 0032-3861
dc.identifier.uri http://hdl.handle.net/10468/8083
dc.identifier.doi 10.1016/j.polymer.2019.04.043 en
dc.description.abstract Uniform, periodic and ordered iron oxide nanopatterns can be generated by selective metal ion inclusion into microphase separated polystyrene-b-poly(ethylene oxide) (PS-b-PEO) block copolymer (BCP) thin films. After solvent mediated metal ion inclusion into the PEO block, an ultraviolet-ozone (UVO) treatment was used to remove the polymer and oxidize the metallic ions to their oxides. This paper provides an in-depth study of the UVO processing steps as a function of exposure time. Surface wettability, topography, morphology, compositional and interfacial changes were analysed by contact angle measurement, microscopic and spectroscopic techniques through the UVO treatment. It was found that the UVO treatment initially cross-links the polymer network followed by oxidation and removal of the polymer simultaneously. It was also found that if short UVO exposure times are used, a post calcination treatment can be used to generate similar patterns. The iron oxide nanopatterns created due to strong coordination bond between metallic ions and free electron pairs of O atoms in the PEO and these interactions are responsible for the final pattern mimicking the original self-assembled BCP morphology. The film thicknesses, surface roughness, the size/shape of the iron oxides and patterns, the amount of residual polymers were also investigated regarding the UVO exposure time. en
dc.format.mimetype application/pdf en
dc.language.iso en en
dc.publisher Elsevier en
dc.relation.uri http://www.sciencedirect.com/science/article/pii/S0032386119303647
dc.rights © 2019 Elsevier Ltd. All rights reserved. This manuscript version is made available under the CC-BY-NC-ND 4.0 license en
dc.rights.uri http://creativecommons.org/licenses/by-nc-nd/4.0/ en
dc.subject Block copolymers en
dc.subject Oxides en
dc.subject Nanoparticles en
dc.subject Patterns en
dc.subject UV/Ozone en
dc.subject XPS en
dc.title Solvent mediated inclusion of metal oxide into block copolymer nanopatterns: mechanism of oxide formation under UV-Ozone treatment en
dc.type Article (peer-reviewed) en
dc.internal.authorcontactother Justin D. Holmes, Chemistry, University College Cork, Cork, Ireland. +353-21-490-3000 Email: j.holmes@ucc.ie en
dc.internal.availability Full text available en
dc.check.info Access to this article is restricted until 24 months after publication by request of the publisher. en
dc.check.date 2021-04-20
dc.date.updated 2019-06-21T11:50:59Z
dc.description.version Accepted Version en
dc.internal.rssid 489963548
dc.contributor.funder Science Foundation Ireland en
dc.description.status Peer reviewed en
dc.identifier.journaltitle Polymer en
dc.internal.copyrightchecked No
dc.internal.licenseacceptance Yes en
dc.internal.IRISemailaddress j.holmes@ucc.ie en
dc.relation.project info:eu-repo/grantAgreement/SFI/SFI Research Centres/12/RC/2278/IE/Advanced Materials and BioEngineering Research Centre (AMBER)/ en
dc.relation.project info:eu-repo/grantAgreement/SFI/SFI Industry Fellowship/15/IFB/3626/IE/Innovative protocol for the development of nanoporous/nanostructured materials patterning using block copolymer lithography for advanced optoelectronic thermal management/ en


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© 2019 Elsevier Ltd. All rights reserved. This manuscript version is made available under the CC-BY-NC-ND 4.0 license Except where otherwise noted, this item's license is described as © 2019 Elsevier Ltd. All rights reserved. This manuscript version is made available under the CC-BY-NC-ND 4.0 license
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