Effects of annealing temperature and ambient on Metal/PtSe2 contact alloy formation

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dc.contributor.author Mirabelli, Gioele
dc.contributor.author Walsh, Lee A.
dc.contributor.author Gity, Farzan
dc.contributor.author Bhattacharjee, Shubhadeep
dc.contributor.author Cullen, Conor P.
dc.contributor.author Ó Coileáin, Cormac
dc.contributor.author Monaghan, Scott
dc.contributor.author McEvoy, Niall
dc.contributor.author Nagle, Roger
dc.contributor.author Hurley, Paul K.
dc.contributor.author Duffy, Ray
dc.date.accessioned 2019-10-26T06:55:07Z
dc.date.available 2019-10-26T06:55:07Z
dc.date.issued 2019-10-10
dc.identifier.citation Mirabelli, G., Walsh, L. A., Gity, F., Bhattacharjee, S., Cullen, C. P., Ó Coileáin, C., Monaghan, S., McEvoy, N., Nagle, R., Hurley, P. K. and Duffy, R. (2019) 'Effects of Annealing Temperature and Ambient on Metal/PtSe2 Contact Alloy Formation', ACS Omega, 4(17), pp. 17487-17493. (7pp.) DOI: 10.1021/acsomega.9b02291 en
dc.identifier.volume 4 en
dc.identifier.issued 17 en
dc.identifier.startpage 17487 en
dc.identifier.endpage 17493 en
dc.identifier.uri http://hdl.handle.net/10468/8875
dc.identifier.doi 10.1021/acsomega.9b02291 en
dc.description.abstract Forming gas annealing is a common process step used to improve the performance of devices based on transition-metal dichalcogenides (TMDs). Here, the impact of forming gas anneal is investigated for PtSe2-based devices. A range of annealing temperatures (150, 250, and 350 °C) were used both in inert (0/100% H2/N2) and forming gas (5/95% H2/N2) environments to separate the contribution of temperature and ambient. The samples are electrically characterized by circular transfer length method structures, from which contact resistance and sheet resistance are analyzed. Ti and Ni are used as metal contacts. Ti does not react with PtSe2 at any given annealing step. In contrast to this, Ni reacts with PtSe2, resulting in a contact alloy formation. The results are supported by a combination of X-ray photoelectron spectroscopy, Raman spectroscopy, energy-dispersive X-ray spectroscopy, and cross-sectional transmission electron microscopy. The work sheds light on the impact of forming gas annealing on TMD–metal interfaces, and on the TMD film itself, which could be of great interest to improve the contact resistance of TMD-based devices. en
dc.description.sponsorship Irish Research Council (EPSPG/2015/69); Higher Education Authority (HEA PRTLI5); en
dc.format.mimetype application/pdf en
dc.language.iso en en
dc.publisher American Chemical Society en
dc.relation.uri https://pubs.acs.org/doi/10.1021/acsomega.9b02291
dc.rights ©2019 American Chemical Society. This is an open access article published under an ACS AuthorChoice License, which permits copying and redistribution of the article or any adaptations for non-commercial purposes. en
dc.rights.uri http://pubs.acs.org/page/policy/authorchoice_termsofuse.html en
dc.subject Effects en
dc.subject Annealing Temperature en
dc.subject Metal/PtSe2 en
dc.subject Contact alloy formation en
dc.title Effects of annealing temperature and ambient on Metal/PtSe2 contact alloy formation en
dc.type Article (peer-reviewed) en
dc.internal.authorcontactother Gioele Mirabelli, Tyndall National Institute, University College Cork, Cork, Ireland. +353-21-490-3000 Email:gioele.mirabelli@tyndall.ie en
dc.internal.availability Full text available en
dc.description.version Published Version en
dc.contributor.funder Science Foundation Ireland en
dc.contributor.funder Irish Research Council en
dc.contributor.funder Higher Education Authority en
dc.contributor.funder Horizon 2020 en
dc.description.status Peer reviewed en
dc.identifier.journaltitle ACS Omega en
dc.internal.IRISemailaddress gioele.mirabelli@tyndall.ie en
dc.relation.project info:eu-repo/grantAgreement/SFI/SFI US Ireland R&D Partnership/13/US/I2862/IE/Understanding the Nature of Interfaces in Two Dimensional Electronic Devises (UNITE)/ en
dc.relation.project info:eu-repo/grantAgreement/SFI/SFI Investigator Programme/15/IA/3131/IE/Investigating Emerging 2D Semiconductor Technology/ en
dc.relation.project info:eu-repo/grantAgreement/EC/H2020::MSCA-COFUND-FP/713567/EU/Cutting Edge Training - Cutting Edge Technology/EDGE en
dc.relation.project info:eu-repo/grantAgreement/SFI/SFI Research Centres/12/RC/2278/IE/Advanced Materials and BioEngineering Research Centre (AMBER)/ en
dc.identifier.eissn 2470-1343

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