Ultraviolet stimulated emission in AlGaN layers grown on sapphire substrates using ammonia and plasma-assisted molecular beam epitaxy

Loading...
Thumbnail Image
Files
12312_Rzheutski.pdf(1.41 MB)
Accepted version
Date
2020-03-03
Authors
Rzheutski, Mikalai V.
Lutsenko, Evgenii V.
Vainilovich, Aliaksei G.
Svitsiankou, Illia E.
Nahorny, Aliaksei V.
Yablonskii, Gennadii P.
Zubialevich, Vitaly Z.
Petrov, Stanislav I.
Alexeev, Alexey N.
Nechaev, Dmitrii V.
Journal Title
Journal ISSN
Volume Title
Publisher
Wiley
Published Version
Research Projects
Organizational Units
Journal Issue
Abstract
Ammonia and plasma‐assisted (PA) molecular beam epitaxy modes are used to grow AlN and AlGaN epitaxial layers on sapphire substrates. It is determined that the increase of thickness of AlN buffer layer grown by ammonia‐MBE from 0.32 μm to 1.25 μm results in the narrowing of 101 X‐Ray rocking curves whereas no clear effect on 002 X‐Ray rocking curve width is observed. It is shown that strong GaN decomposition during growth by ammonia‐MBE causes AlGaN surface roughening and compositional inhomogeneity, which leads to deterioration of its lasing properties. AlGaN layers grown by ammonia‐MBE at optimized temperature demonstrate stimulated emission (SE) peaked at λ = 330 nm, 323 nm, 303 nm and 297 nm with the SE threshold values of 0.7 MW cm−2, 1.1 MW cm−2, 1.4 MW cm−2 and 1.4 MW cm−2, respectively. In comparison to these, AlGaN layer grown using PA‐MBE pulsed modes (migration‐enhanced epitaxy, metal‐modulated epitaxy, and droplet elimination by thermal annealing) shows a SE with a relatively low threshold (0.8 MW cm−2) at the considerably shorter wavelength of λ = 267 nm.
Description
Keywords
AlGaN , AlN , Molecular beam epitaxy , Stimulated emission , Structural properties
Citation
Rzheutski, M. V., Lutsenko, E. V., Vainilovich, A. G., Svitsiankou, I. E., Nahorny, A. V., Yablonskii, G. P., Zubialevich, V. Z., Petrov, S. I., Alexeev, A. N., Nechaev, D. V. and Jmerik, V. N. 'Ultraviolet Stimulated Emission in AlGaN Layers Grown on Sapphire Substrates using Ammonia and Plasma-Assisted Molecular Beam Epitaxy', Physica Status Solidi (A), doi: 10.1002/pssa.201900927
Copyright
© 2020. This article is protected by copyright. All rights reserved. This is the peer reviewed version of the following article: Rzheutski, M.V., Lutsenko, E.V., Vainilovich, A.G., Svitsiankou, I.E., Nahorny, A.V., Yablonskii, G.P., Zubialevich, V.Z., Petrov, S.I., Alexeev, A.N., Nechaev, D.V. and Jmerik, V.N. (2020), Ultraviolet Stimulated Emission in AlGaN Layers Grown on Sapphire Substrates using Ammonia and Plasma‐Assisted Molecular Beam Epitaxy. Phys. Status Solidi A. Accepted Author Manuscript, which will be published in final form at https://doi.org/10.1002/pssa.201900927. This article may be used for non-commercial purposes in accordance with Wiley Terms and Conditions for Self-Archiving