Porous alumina thin films on conductive substrates for templated 1-dimensional nanostructuring
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Accepted Version
Date
2012-05-28
Authors
Holubowitch, Nicolas E.
Nagle, Lorraine C.
Rohan, James F.
Journal Title
Journal ISSN
Volume Title
Publisher
Elsevier
Published Version
Abstract
The growth of thin porous anodic aluminum oxide (AAO) films on silicon by anodizing Al on Ti/Au/Si and Ti/Pt/Si substrates in oxalic acid was demonstrated. Removal of the Al2O3 barrier layer was effected by selective chemical etching in H3PO4 and a reversed bias method in the anodizing solution. Ion transport and the influence of the Ti adhesion layer at the oxide–metal interface during the critical stages of anodization and pore opening were investigated. The AAO films may be exploited as templates in the creation of silicon-integrated nanostructured wire arrays. Electrodeposition of Pt into the AAO template yielded a nanowire array with superior methanol oxidation activity that can be integrated in a micro direct methanol fuel cell.
Description
Keywords
AAO template , Barrier layer , Ti adhesion layer , Si integration , Pt nanowire array , DMFC
Citation
Holubowitch, N.,Nagle, L. C.,Rohan, J. F. (2012) 'Porous alumina thin films on conductive substrates for templated 1-dimensional nanostructuring'. Solid State Ionics, 216 :110-113. doi: http://dx.doi.org/10.1016/j.ssi.2012.03.016
Copyright
Copyright © 2012 Elsevier B.V. All rights reserved. NOTICE: this is the author’s version of a work that was accepted for publication in Solid State Ionics. Changes resulting from the publishing process, such as peer review, editing, corrections, structural formatting, and other quality control mechanisms may not be reflected in this document. Changes may have been made to this work since it was submitted for publication. A definitive version was subsequently published in Solid State Ionics, [Volume 216, 28 May 2012] DOI: http://dx.doi.org/10.1016/j.ijhydene.2010.09.077