• Impact of metal hybridization on contact resistance and leakage current of carbon nanotube transistors 

  Su, Sheng-Kai; Sanchez-Soares, Alfonso; Chen, Edward; Kelly, Thomas; Fagas, Giorgos; Greer, James C.; Pitner, Gregory; Wong, H.-S. Philip; Radu, Iuliana P. (Institute of Electrical and Electronics Engineers (IEEE), 2022-06-24)

  Carbon nanotube field effect transistors (CNFETs) have potential applications in future logic technology as they display good electrostatic control and excellent transport properties. However, contact resistance and leakage ...
• Exploratory study and application of the angular wavelet analysis for assessing the spatial distribution of breakdown spots in Pt/HfO2/Pt structures 

  Muñoz-Gorriz, J.; Monaghan, Scott; Cherkaoui, Karim; Suñé, J.; Hurley, Paul K.; Miranda, E. (AIP Publishing, 2017-12-05)

  The angular wavelet analysis is applied for assessing the spatial distribution of breakdown spots in Pt/HfO2/Pt capacitors with areas ranging from 104 to 105 μm2. The breakdown spot lateral sizes are in the range from 1 ...
• The structural and electrical characterization of a HfErOx dielectric for MIM capacitor DRAM applications 

  Toomey, B.; Cherkaoui, Karim; Monaghan, Scott; Djara, Vladimir; O'Connor, Éamon; O'Connell, D.; Oberbeck, L.; Tois, E.; Blomberg, T.; Newcomb, S. B.; Hurley, Paul K. (Elsevier B.V., 2012-01-12)

  Hafnium erbium oxide (HfErOx) thin films were formed using atomic layer deposition. The effect of using different Hf:Er pulse ratios on the electrical and structural properties of the HfErOx thin films (∼9 nm) in ...
• Multi-technique characterisation of MOVPE-grown GaAs on Si 

  Wong, Chiu Soon; Bennett, Nick S.; McNally, Patrick J.; Galiana, B.; Tejedor, P.; Benedicto, M.; Molina-Aldareguia, J. M.; Monaghan, Scott; Hurley, Paul K.; Cherkaoui, Karim (Elsevier B.V., 2010-10-08)

  The heterogeneous integration of III-V materials on a Si CMOS platform offers tremendous prospects for future high-speed and low-power logic applications. That said this integration generates immense scientific and ...
• Structural and optical properties of post-annealed atomic-layer-deposited HfO2 thin films on GaAs 

  Bennett, N.S.; Cherkaoui, Karim; Wong, C. S.; O'Connor, Éamon; Monaghan, Scott; Hurley, Paul K.; Chauhan, L.; McNally, P. J. (Elsevier B.V., 2014-08-29)

  The effects of post-annealing conditions on solid-phase crystallization of atomic-layer-deposited HfO2 films grown on GaAs were investigated. Film properties, including crystallinity (preferential crystal orientation and ...

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