• Modelling the chemical mechanism of the thermal atomic layer etch of aluminium oxide: a density functional theory study of reactions during HF exposure 

  Kondati Natarajan, Suresh; Elliott, Simon D. (American Chemical Society (ACS), 2018-08-09)

  Thermal atomic layer etch, the reverse of atomic layer deposition, uses a cyclic sequence of plasma-free and solvent-free gas-surface reactions to remove ultra thin layers of material with a high degree of control. A ...
• Solvent and stabilizer free growth of Ag and Pd nanoparticles using metallic salts/cyclotriphosphazenes mixtures 

  Díaz Valenzuela, Carlos; Valenzuela, María Luisa; Caceres, S.; Diaz, R.; O'Dwyer, Colm (Elsevier, 2013-09-30)

  Cyclotriphosphazene is used as a sacrificial solid-state template to synthesize a range of Ag and Pd nanoparticles with diverse geometries by thermal treatment using MLn/N3P3(O2C12H8)3 mixtures. The Pd and Ag nanoparticles ...
• Pseudocapacitance of α-CoMoO4 nanoflakes in non-aqueous electrolyte and its bi-functional electro catalytic activity for methanol oxidation 

  Padmanathan, Narayanasamy; Shao, Han; Selladurai, Subramanian; Glynn, Colm; O'Dwyer, Colm; Razeeb, Kafil M. (Elsevier, 2015-10-23)

  Nanocrystalline cobalt molybdate (CoMoO4) nanoflakes were grown directly on carbon fibre cloth (CFC) via a simple hydrothermal method without any template or surfactant. A symmetric supercapacitor was fabricated using ...
• Elucidating structure-property relationships in the design of metal nanoparticle catalysts for the activation of molecular oxygen 

  Hinde, Christopher S.; Ansovini, Davide; Wells, Peter P.; Collins, Gillian; Van Aswegen, Sivan; Holmes, Justin D.; Hor, T. S. Andy; Raja, Robert (American Chemical Society (ACS), 2015-05-14)

  A novel synthetic strategy for the design of metal nanoparticles by extrusion of anionic chloride precursors from a porous copper chlorophosphate framework has been devised for the sustainable aerobic oxidation of vanillyl ...
• Characterisation of a novel electron beam lithography resist, SML and its comparison to PMMA and ZEP resists 

  Gangnaik, Anushka S.; Georgiev, Yordan M.; McCarthy, Brendan; Petkov, Nikolay; Djara, Vladimir; Holmes, Justin D. (Elsevier, 2014-08)

  As transistor dimensions continue to diminish, techniques for fabrication need to be adapted. In particular, crystal recovery post ion implantation is required due to destructive ion bombardment inducing crystal damage ...

View more