Block copolymer self-assembly: ordered film formation and defect analysis

Abstract

The self-assembly of block copolymers (BCPs) is a promising strategy for the creation of nanoscale structures for use in a wide range of applications. In particular, as conventional photolithographic methods of fabricating nanoelectronics approach their physical limitations, BCPs offer a route to continue scaling down feature size. This thesis investigated the ability of BCPs in thin film to form well-ordered patterns in the nanometre range using a series of polystyrene-block-poly(ethylene oxide) (PS-b-PEO), polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) and polystyrene-block-poly(2-vinylpyridine) (PS-b-P2VP) for lithographic applications. A novel application for the analysis of BCP patterns is detailed, as a tool for the further optimisation of microphase separation techniques.