Long-term stability of transparent n/p ZnO homojunctions grown by rf-sputtering at room-temperature

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dc.contributor.author Kampylafka, V.
dc.contributor.author Kostopoulos, A.
dc.contributor.author Modreanu, Mircea
dc.contributor.author Schmidt, Michael
dc.contributor.author Gagaoudakis, E.
dc.contributor.author Tsagaraki, K.
dc.contributor.author Kontomitrou, V.
dc.contributor.author Konstantinidis, G.
dc.contributor.author Deligeorgis, G.
dc.contributor.author Kiriakidis, G.
dc.contributor.author Aperathitis, E.
dc.date.accessioned 2019-11-23T06:29:07Z
dc.date.available 2019-11-23T06:29:07Z
dc.date.issued 2019-02-13
dc.identifier.citation Kampylafka, V., Kostopoulos, A., Modreanu, M., Schmidt, M., Gagaoudakis, E., Tsagaraki, K., Kontomitrou, V., Konstantinidis, G., Deligeorgis, G., Kiriakidis, G. and Aperathitis, E., 2019. Long-term stability of transparent n/p ZnO homojunctions grown by rf-sputtering at room-temperature. Journal of Materiomics. (8pp). DOI: 10.1016/j.jmat.2019.02.006 en
dc.identifier.startpage 1 en
dc.identifier.endpage 8 en
dc.identifier.uri http://hdl.handle.net/10468/9185
dc.identifier.doi 10.1016/j.jmat.2019.02.006 en
dc.description.abstract ZnO-based n/p homojunctions were fabricated by sputtering from a single zinc nitride target at room temperature on metal or ITO-coated glass and Si substrates. A multi-target rf-sputtering system was used for the growth of all oxide films as multilayers in a single growth run without breaking the vacuum in the growth chamber. The nitrogen-containing films (less than 1.5 at.% of nitrogen) were n-type ZnO when deposited in oxygen-deficient Ar plasma (10% O2) and p-type ZnO when deposited in oxygen-rich Ar plasma (50% O2). The all-oxide homojunction ITO/n-ZnO/p-ZnO/ITO/glass was fabricated in a single deposition run and exhibited visible transparency in the range of 75–85%. The n/p ZnO homojunctions, having metallic contacts, formed on conventionally processed substrates showed a fairly unstable behavior concerning the current-voltage characteristics. However, the same homojunctions formed on Si3N4-patterned substrates and stored in atmosphere for a period of five months were stable exhibiting a turn-on voltage of around 1.5 V. The realization of a room temperature sputtered transparent and stable ZnO homojunction paves the way to the realization of all-oxide transparent optoelectronic devices. en
dc.description.sponsorship Materials and Processes for Energy and Environment Applications project (AENAO, MIS 5002556); Electronics Beyond Silicon Era (ELBESIER) project en
dc.format.mimetype application/pdf en
dc.language.iso en en
dc.publisher Chinese Ceramic Society en
dc.relation.uri http://www.sciencedirect.com/science/article/pii/S2352847818301898
dc.rights © 2019 The Chinese Ceramic Society. Production and hosting by Elsevier B.V en
dc.rights.uri https://creativecommons.org/licenses/by-nc-nd/4.0/ en
dc.subject ZnO homojunction en
dc.subject p-type ZnO en
dc.subject Single step sputtering en
dc.subject Stability en
dc.subject Patterned substrate en
dc.title Long-term stability of transparent n/p ZnO homojunctions grown by rf-sputtering at room-temperature en
dc.type Article (peer-reviewed) en
dc.internal.authorcontactother Mircea Modreanu, Tyndall National Institute, University College Cork, Cork, Ireland. +353-21-490-3000 Email: mircea.modreanu@tyndall.ie en
dc.internal.availability Full text available en
dc.description.version Published Version en
dc.contributor.funder Horizon 2020 en
dc.contributor.funder European Regional Development Fund en
dc.contributor.funder Greece en
dc.description.status Peer reviewed en
dc.identifier.journaltitle Journal of Materiomics en
dc.internal.IRISemailaddress mircea.modreanu@tyndall.ie en
dc.relation.project info:eu-repo/grantAgreement/EC/H2020::RIA/654384/EU/Access to European Nanoelectronics Network/ASCENT en
dc.relation.project info:eu-repo/grantAgreement/EC/FP7::SP1::NMP/246334/EU/Oxide Materials Towards a Matured Post-silicon Electronics Era/ORAMA en
dc.identifier.eissn 2352-8478


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© 2019 The Chinese Ceramic Society. Production and hosting by Elsevier B.V Except where otherwise noted, this item's license is described as © 2019 The Chinese Ceramic Society. Production and hosting by Elsevier B.V
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