Insertion of metal oxides into block copolymer nanopatterns as robust etch masks for nanolithography

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dc.check.chapterOfThesisChapter 1; Chapter 3
dc.check.embargoformatE-thesis on CORA onlyen
dc.check.opt-outNoen
dc.check.reasonThis thesis is due for publication or the author is actively seeking to publish this materialen
dc.contributor.advisorMorris, Michael A.en
dc.contributor.advisorHolmes, Justin D.en
dc.contributor.authorCummins, Cian
dc.contributor.funderScience Foundation Irelanden
dc.date.accessioned2015-12-09T10:49:07Z
dc.date.issued2015
dc.date.submitted2015
dc.description.abstractDirected self-assembly (DSA) of block copolymers (BCPs) is a prime candidate to further extend dimensional scaling of silicon integrated circuit features for the nanoelectronic industry. Top-down optical techniques employed for photoresist patterning are predicted to reach an endpoint due to diffraction limits. Additionally, the prohibitive costs for “fabs” and high volume manufacturing tools are issues that have led the search for alternative complementary patterning processes. This thesis reports the fabrication of semiconductor features from nanoscale on-chip etch masks using “high χ” BCP materials. Fabrication of silicon and germanium nanofins via metal-oxide enhanced BCP on-chip etch masks that might be of importance for future Fin-field effect transistor (FinFETs) application are detailed.en
dc.description.sponsorshipScience Foundation Ireland (SFI Grant 09/IN.1/602)en
dc.description.statusNot peer revieweden
dc.description.versionAccepted Version
dc.format.mimetypeapplication/pdfen
dc.identifier.citationCummins, C. A. 2015. Insertion of metal oxides into block copolymer nanopatterns as robust etch masks for nanolithography. PhD Thesis, University College Cork.en
dc.identifier.endpage267
dc.identifier.urihttps://hdl.handle.net/10468/2131
dc.language.isoenen
dc.publisherUniversity College Corken
dc.rights© 2015, Cian A. Cumminsen
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/3.0/en
dc.subjectNanotechnologyen
dc.subjectMaterials scienceen
dc.subjectMetal oxidesen
dc.subjectBlock copolymersen
dc.subjectPolymersen
dc.subjectNanolithographyen
dc.subjectSiliconen
dc.subjectSemiconductorsen
dc.subjectNanopatternsen
dc.thesis.opt-outfalse
dc.titleInsertion of metal oxides into block copolymer nanopatterns as robust etch masks for nanolithographyen
dc.typeDoctoral thesisen
dc.type.qualificationlevelDoctoralen
dc.type.qualificationnamePhD (Science)en
ucc.workflow.supervisorm.morris@ucc.ie
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