Cyclical 'flipping' of morphology in block copolymer films

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dc.contributor.authorMokarian-Tabari, Parvaneh
dc.contributor.authorCollins, Timothy W.
dc.contributor.authorHolmes, Justin D.
dc.contributor.authorMorris, Michael A.
dc.date.accessioned2018-09-18T15:22:38Z
dc.date.available2018-09-18T15:22:38Z
dc.date.issued2011-05-26
dc.date.updated2018-08-06T14:49:00Z
dc.description.abstractWe studied the kinetics of nanopattern evolution in (polystyrene-b-polyethylene oxide) diblock copolymer thin films. Using scanning force microscopy, a highly unexpected cylindrical flipping of morphology from normal to parallel to the film plane was detected during solvent annealing of the film (with average thickness of 30 nm) at high vapor pressure. Using an in situ time-resolved light scattering device combined with an environmental cell enabled us to obtain kinetic information at different vapor pressures. The data indicated that there is a threshold value for the vapor pressure necessary for the structural transition. We propose a swelling and deswelling mechanism for the orientation flipping of the morphology. The cyclic transition occurs faster in thick films (177 nm) where the mass uptake and solvent volume fraction is smaller and therefore the driving force for phase separation is higher. We induced a stronger segregation by confining the chains in graphoepitaxially patterned substrates. As expected, the cyclic transition occurred at higher rate. Our work is another step forward to understanding the structure evolution and also controlling the alignment of block copolymer nanocylinders independently of thickness and external fields.en
dc.description.statusPeer revieweden
dc.description.versionAccepted Versionen
dc.format.mimetypeapplication/pdfen
dc.identifier.citationMokarian-Tabari, P., Collins, T. W., Holmes, J. D. and Morris, M. A. (2011) 'Cyclical “Flipping” of Morphology in Block Copolymer Thin Films', ACS Nano, 5(6), pp. 4617-4623. doi: 10.1021/nn2003629en
dc.identifier.doi10.1021/nn2003629
dc.identifier.endpage4623en
dc.identifier.issn1936-0851
dc.identifier.journaltitleAcs Nanoen
dc.identifier.startpage4617en
dc.identifier.urihttps://hdl.handle.net/10468/6806
dc.identifier.volume5en
dc.language.isoenen
dc.publisherAmerican Chemical Society (ACS)en
dc.relation.projectinfo:eu-repo/grantAgreement/SFI/SFI Centre for Science Engineering and Technology (CSET)/03/CE3/M407B/IE/CSET CRANN: Construction of Specialised Laboratory for Nanoscience Research - CRANN/en
dc.relation.urihttps://pubs.acs.org/doi/abs/10.1021/nn2003629
dc.rights© 2011 American Chemical Society. This document is the Accepted Manuscript version of a Published Work that appeared in final form in ACS Nano, copyright © American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see https://pubs.acs.org/doi/abs/10.1021/nn2003629en
dc.subjectBlock copolymer thin filmsen
dc.subjectCyclical morphology transitionen
dc.subjectGraphoepitaxial alignmenten
dc.subjectIn-situ light scatteringen
dc.subjectNanopattern evolutionen
dc.titleCyclical 'flipping' of morphology in block copolymer filmsen
dc.typeArticle (peer-reviewed)en
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