HfO2‐based ferroelectrics applications in nanoelectronics

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dc.check.date2022-01-14
dc.check.infoAccess to this article is restricted until 12 months after publication by request of the publisher.en
dc.contributor.authorDragoman, Mircea
dc.contributor.authorAldrigo, Martino
dc.contributor.authorDragoman, Daniela
dc.contributor.authorIordanescu, Sergiu
dc.contributor.authorDinescu, Adrian
dc.contributor.authorModreanu, Mircea
dc.contributor.funderHorizon 2020en
dc.contributor.funderUnitatea Executiva pentru Finantarea Invatamantului Superior, a Cercetarii, Dezvoltarii si Inovariien
dc.date.accessioned2021-03-05T10:09:11Z
dc.date.available2021-03-05T10:09:11Z
dc.date.issued2021-01-14
dc.date.updated2021-03-05T09:40:08Z
dc.description.abstractThis article is dedicated to HfO2-based ferroelectrics applications in nanoelectronics, especially to topics not well developed up to now, such as microwaves, energy harvesting, and neuromorphic devices working as artificial neurons and synapses. Other well-covered topics in the literature, such as memories or negative-capacitance ferroelectric field-effect transistors, will be only briefly mentioned. The main impact of HfO2-based ferroelectrics is the possibility of using them for fabricating at the wafer-level complementary metal oxide semiconductor (CMOS) compatible high-frequency devices, such as phase-shifters, antenna arrays, or filters with a high degree of tunability and miniaturization, as well as energy harvesting devices and neuromorphic key components. In addition, the recent transfer of 2D materials on HfO2 ferroelectrics has demonstrated new physical effects, such as opening a 0.2 eV bandgap in graphene monolayers, and allows the manufacture of very high-mobility field-effect transistors (FETs) based on graphene/HfZrO.en
dc.description.sponsorshipUnitatea Executiva pentru Finantarea Invatamantului Superior, a Cercetarii, Dezvoltarii si Inovarii (UEFISCDI project number PN‐III‐P4‐ID‐PCCF‐2016‐0033 “GrapheneFerro”)en
dc.description.statusPeer revieweden
dc.description.versionAccepted Versionen
dc.format.mimetypeapplication/pdfen
dc.identifier.articleid2000521en
dc.identifier.citationDragoman, M., Aldrigo, M., Dragoman, D., Iordanescu, S., Dinescu, A. and Modreanu, M. (2021) 'HfO2‐based ferroelectrics applications in nanoelectronics', physica status solidi (RRL) - Rapid Research Letters, 2000521 (13pp). doi: 10.1002/pssr.202000521en
dc.identifier.doi10.1002/pssr.202000521en
dc.identifier.eissn1862-6270
dc.identifier.endpage13en
dc.identifier.issn1862-6254
dc.identifier.journaltitlephysica status solidi (RRL) - Rapid Research Lettersen
dc.identifier.startpage1en
dc.identifier.urihttps://hdl.handle.net/10468/11116
dc.language.isoenen
dc.publisherJohn Wiley & Sons, Inc.en
dc.relation.projectinfo:eu-repo/grantAgreement/EC/H2020::RIA/951761/EU/NANOMATERIALS ENABLING SMART ENERGY HARVESTING FOR NEXT-GENERATION INTERNET-OF-THINGS/NANO-EHen
dc.rights© 2021, Wiley‐VCH GmbH. This is the peer reviewed version of the following article: Dragoman, M., Aldrigo, M., Dragoman, D., Iordanescu, S., Dinescu, A. and Modreanu, M. (2021) 'HfO2‐based ferroelectrics applications in nanoelectronics', physica status solidi (RRL) - Rapid Research Letters, 2000521 (13pp), doi: 10.1002/pssr.202000521, which has been published in final form at https://doi.org/10.1002/pssr.202000521. This article may be used for non-commercial purposes in accordance with Wiley Terms and Conditions for Use of Self-Archived Versions.en
dc.subject2D materialsen
dc.subject2D/ferroelectrics heterostructuresen
dc.subjectEnergy harvestingen
dc.subjectFerroelectricsen
dc.subjectMicrowavesen
dc.titleHfO2‐based ferroelectrics applications in nanoelectronicsen
dc.typeArticle (peer-reviewed)en
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