Atomic layer deposition of intermetallic Fe4Zn9 thin films from diethyl zinc

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dc.contributor.authorGhiyasi, Ramin
dc.contributor.authorPhilip, Anish
dc.contributor.authorLiu, Ji
dc.contributor.authorJulin, Jaakko
dc.contributor.authorSajavaara, Timo
dc.contributor.authorNolan, Michael
dc.contributor.authorKarppinen, Maarit
dc.contributor.funderHorizon 2020en
dc.contributor.funderAcademy of Finlanden
dc.contributor.funderTekniikan Edistämissäätiöen
dc.date.accessioned2022-09-30T11:04:19Z
dc.date.available2022-09-30T11:04:19Z
dc.date.issued2022-05-22
dc.date.updated2022-09-30T10:51:03Z
dc.description.abstractWe present a new type of atomic layer deposition (ALD) process for intermetallic thin films, where diethyl zinc (DEZ) serves as a coreactant. In our proof-of-concept study, FeCl3 is used as the second precursor. The FeCl3 + DEZ process yields in situ crystalline Fe4Zn9 thin films, where the elemental purity and Fe/Zn ratio are confirmed by time-of-flight elastic recoil detection analysis (TOF-ERDA), Rutherford backscattering spectrometry (RBS), atomic absorption spectroscopy (AAS), and energy-dispersive X-ray spectroscopy (EDX) analyses. The film thickness is precisely controlled by the number of precursor supply cycles, as expected for an ALD process. The reaction mechanism is addressed by computational density functional theory (DFT) modeling. We moreover carry out preliminary tests with CuCl2 and Ni(thd)2 in combination with DEZ to confirm that these processes yield Cu-Zn and Ni-Zn thin films with DEZ as well. Thus, we envision an opening of a new ALD approach based on DEZ for intermetallic/metal alloy thin films.en
dc.description.sponsorshipAcademy of Finland (Flagship PREIN); Tekniikan Edistämissäätiö (PoDoCo funding); Science Foundation Ireland (Grant No. 17/NSFC/5279)en
dc.description.statusPeer revieweden
dc.description.versionPublished Versionen
dc.format.mimetypeapplication/pdfen
dc.identifier.citationGhiyasi, R., Philip, A., Liu, J., Julin, J., Sajavaara, T., Nolan, M. and Karppinen, M. (2022) 'Atomic layer deposition of intermetallic Fe4Zn9 thin films from diethyl zinc', Chemistry of Materials, 34(11), pp. 5241-5248. doi: 10.1021/acs.chemmater.2c00907en
dc.identifier.doi10.1021/acs.chemmater.2c00907en
dc.identifier.eissn1520-5002
dc.identifier.endpage5248en
dc.identifier.issn0897-4756
dc.identifier.issued11en
dc.identifier.journaltitleChemistry of Materialsen
dc.identifier.startpage5241en
dc.identifier.urihttps://hdl.handle.net/10468/13713
dc.identifier.volume34en
dc.language.isoenen
dc.publisherAmerican Chemical Societyen
dc.relation.projectinfo:eu-repo/grantAgreement/EC/H2020::MSCA-ITN-ETN/765378/EU/A European Training Network for Functional Hybrid Coatings by Molecular Layer Deposition/HYCOATen
dc.rights© 2022, the Authors. Published by American Chemical Society. Open Access. This article is made available under the CC BY 4.0 licence.en
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/en
dc.subjectAtomic layer depositionen
dc.subjectIntermetallic Fe4Zn9 thin filmsen
dc.subjectDiethyl zincen
dc.titleAtomic layer deposition of intermetallic Fe4Zn9 thin films from diethyl zincen
dc.typeArticle (peer-reviewed)en
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