Copper reduction and atomic layer deposition by oxidative decomposition of formate by hydrazine

Dey, Gangotri; Elliott, Simon D.

Copper reduction and atomic layer deposition by oxidative decomposition of formate by hydrazine

dc.contributor.author	Dey, Gangotri
dc.contributor.author	Elliott, Simon D.
dc.contributor.funder	Science Foundation Ireland	en
dc.date.accessioned	2014-06-16T12:15:13Z
dc.date.available	2015-07-30T04:00:06Z
dc.date.issued	2014
dc.description.abstract	We have used density functional theory (DFT) to study the mechanism of three step atomic layer deposition (ALD) of copper via formate and hydrazine. The technique holds promise for deposition of other transition metals.	en
dc.description.sponsorship	Science Foundation Ireland (ALDesign project, grant number 09.IN1.I2628)	en
dc.description.status	Peer reviewed	en
dc.description.version	Accepted Version	en
dc.format.mimetype	application/pdf	en
dc.identifier.citation	DEY, G. & ELLIOT, S. D. 2014. Copper reduction and atomic layer deposition by oxidative decomposition of formate by hydrazine. RSC Advances. 4, 34448-34453. http://dx.doi.org/10.1039/C4RA07003H	en
dc.identifier.doi	10.1039/C4RA07003H
dc.identifier.endpage	34453
dc.identifier.issn	2046-2069
dc.identifier.journaltitle	RSC Advances	en
dc.identifier.startpage	34448
dc.identifier.uri	https://hdl.handle.net/10468/1577
dc.language.iso	en	en
dc.publisher	The Royal Society of Chemistry	en
dc.rights	© The Royal Society of Chemistry 2014. Reproduced by permission of The Royal Society of Chemistry.	en
dc.subject	Density functional theory (DFT)	en
dc.subject	Atomic layer deposition (ALD)	en
dc.subject.lcsh	Atomic layer deposition	en
dc.subject.lcsh	Density functional theory	en
dc.title	Copper reduction and atomic layer deposition by oxidative decomposition of formate by hydrazine	en