Fabrication of MoS2 nanowire arrays and layered structures via the self-assembly of block copolymers

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dc.contributor.authorChaudhari, Atul
dc.contributor.authorGhoshal, Tandra
dc.contributor.authorShaw, Matthew T.
dc.contributor.authorO'Connell, John
dc.contributor.authorKelly, Róisín A.
dc.contributor.authorGlynn, Colm
dc.contributor.authorO'Dwyer, Colm
dc.contributor.authorHolmes, Justin D.
dc.contributor.authorMorris, Michael A.
dc.contributor.funderScience Foundation Irelanden
dc.contributor.funderSemiconductor Research Corporationen
dc.date.accessioned2018-06-14T15:45:04Z
dc.date.available2018-06-14T15:45:04Z
dc.date.issued2016-03-01
dc.date.updated2018-06-11T21:18:16Z
dc.description.abstractThe electronics industry is beginning to show interest in 2D molybdenum disulfide (2D‐MoS2) as a potential device material due to its low band gap and high mobility. However, current methods for its synthesis are not “fab” friendly and require harsh environments and processes. Here, a novel method to prepare MoS2 nanowire arrays and layered structures via self‐assembly of a block copolymer system is reported. Well‐controlled films of microphase separated line‐space nanopatterns have been achieved by solvent annealing process. The self‐assembled films are used as “templates” for the generation of nonstoichometric molybdenum oxide by in situ inclusion technique following UV/Ozone treatment. Well‐ordered array of MoS2 and a layered structure are then prepared by chemical vapor deposition using sulfur powder at lower temperature. The surface morphology, crystal structure, and phases are examined by different microscopic and spectroscopic techniques. This strategy can be extended to several other 2D materials systems and open the pathway toward better optoelectronic and nanoelectromechanical systems.en
dc.description.sponsorshipSemiconductor Research Corporation (SRC grant 2013-OJ-2444)en
dc.description.statusPeer revieweden
dc.description.versionAccepted Versionen
dc.format.mimetypeapplication/pdfen
dc.identifier.citationChaudhari, A., Ghoshal, T., Shaw, M. T., O'Connell, J., Kelly, Roisin A., Glynn C., O'Dwyer C., Holmes, J. D. and Morris, M A. (2016) 'Fabrication of MoS2 Nanowire Arrays and Layered Structures via the Self‐Assembly of Block Copolymers', Advanced Materials Interfaces, 3(11), 1500596 (9 pp). doi: 10.1002/admi.201500596en
dc.identifier.doi10.1002/admi.201500596
dc.identifier.endpage1500596-9en
dc.identifier.issn2196-7350
dc.identifier.journaltitleAdvanced Materials Interfacesen
dc.identifier.startpage1500596-1en
dc.identifier.urihttps://hdl.handle.net/10468/6308
dc.identifier.volume3en
dc.language.isoenen
dc.publisherWileyen
dc.relation.projectinfo:eu-repo/grantAgreement/SFI/SFI Research Centres/12/RC/2278/IE/Advanced Materials and BioEngineering Research Centre (AMBER)/en
dc.relation.urihttp://onlinelibrary.wiley.com/doi/10.1002/admi.201500596/abstract
dc.rights© 2016 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. This is the peer reviewed version of the following article: (2016). Fabrication of MoS2 Nanowire Arrays and Layered Structures via the Self‐Assembly of Block Copolymers. Adv. Mater. Interfaces, 3: 1500596, which has been published in final form at https://doi.org/10.1002/admi.201500596. This article may be used for non-commercial purposes in accordance with Wiley Terms and Conditions for Self-Archiving.en
dc.subject2D-MoS2en
dc.subjectBlock copolymersen
dc.subjectSelf-assemblyen
dc.subjectSulfurizationen
dc.titleFabrication of MoS2 nanowire arrays and layered structures via the self-assembly of block copolymersen
dc.typeArticle (peer-reviewed)en
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