Solvent mediated inclusion of metal oxide into block copolymer nanopatterns: mechanism of oxide formation under UV-Ozone treatment

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dc.contributor.authorGhoshal, Tandra
dc.contributor.authorO'Connell, John
dc.contributor.authorSinturel, Christophe
dc.contributor.authorAndreazza, Pascal
dc.contributor.authorHolmes, Justin D.
dc.contributor.authorMorris, Michael A.
dc.contributor.funderScience Foundation Irelanden
dc.date.accessioned2019-06-21T11:56:01Z
dc.date.available2019-06-21T11:56:01Z
dc.date.issued2019-04-20
dc.date.updated2019-06-21T11:50:59Z
dc.description.abstractUniform, periodic and ordered iron oxide nanopatterns can be generated by selective metal ion inclusion into microphase separated polystyrene-b-poly(ethylene oxide) (PS-b-PEO) block copolymer (BCP) thin films. After solvent mediated metal ion inclusion into the PEO block, an ultraviolet-ozone (UVO) treatment was used to remove the polymer and oxidize the metallic ions to their oxides. This paper provides an in-depth study of the UVO processing steps as a function of exposure time. Surface wettability, topography, morphology, compositional and interfacial changes were analysed by contact angle measurement, microscopic and spectroscopic techniques through the UVO treatment. It was found that the UVO treatment initially cross-links the polymer network followed by oxidation and removal of the polymer simultaneously. It was also found that if short UVO exposure times are used, a post calcination treatment can be used to generate similar patterns. The iron oxide nanopatterns created due to strong coordination bond between metallic ions and free electron pairs of O atoms in the PEO and these interactions are responsible for the final pattern mimicking the original self-assembled BCP morphology. The film thicknesses, surface roughness, the size/shape of the iron oxides and patterns, the amount of residual polymers were also investigated regarding the UVO exposure time.en
dc.description.statusPeer revieweden
dc.description.versionAccepted Versionen
dc.format.mimetypeapplication/pdfen
dc.identifier.citationGhoshal, T., O'Connell, J., Sinturel, C., Andreazza, P., Holmes, J. D. and Morris, M. A. (2019) 'Solvent mediated inclusion of metal oxide into block copolymer nanopatterns: Mechanism of oxide formation under UV-Ozone treatment', Polymer, 173, pp. 197-204. doi: 10.1016/j.polymer.2019.04.043en
dc.identifier.doi10.1016/j.polymer.2019.04.043en
dc.identifier.endpage204en
dc.identifier.issn0032-3861
dc.identifier.journaltitlePolymeren
dc.identifier.startpage197en
dc.identifier.urihttps://hdl.handle.net/10468/8083
dc.identifier.volume173en
dc.language.isoenen
dc.publisherElsevieren
dc.relation.projectinfo:eu-repo/grantAgreement/SFI/SFI Research Centres/12/RC/2278/IE/Advanced Materials and BioEngineering Research Centre (AMBER)/en
dc.relation.projectinfo:eu-repo/grantAgreement/SFI/SFI Industry Fellowship/15/IFB/3626/IE/Innovative protocol for the development of nanoporous/nanostructured materials patterning using block copolymer lithography for advanced optoelectronic thermal management/en
dc.relation.urihttp://www.sciencedirect.com/science/article/pii/S0032386119303647
dc.rights© 2019 Elsevier Ltd. All rights reserved. This manuscript version is made available under the CC-BY-NC-ND 4.0 licenseen
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/4.0/en
dc.subjectBlock copolymersen
dc.subjectOxidesen
dc.subjectNanoparticlesen
dc.subjectPatternsen
dc.subjectUV/Ozoneen
dc.subjectXPSen
dc.titleSolvent mediated inclusion of metal oxide into block copolymer nanopatterns: mechanism of oxide formation under UV-Ozone treatmenten
dc.typeArticle (peer-reviewed)en
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