Development of ordered, porous (sub-25 nm dimensions) surface membrane structures using a block copolymer approach

dc.contributor.authorGhoshal, Tandra
dc.contributor.authorHolmes, Justin D.
dc.contributor.authorMorris, Michael A.
dc.contributor.funderScience Foundation Irelanden
dc.description.abstractIn an effort to develop block copolymer lithography to create high aspect vertical pore arrangements in a substrate surface we have used a microphase separated poly(ethylene oxide) -b- polystyrene (PEO-b-PS) block copolymer (BCP) thin film where (and most unusually) PS not PEO is the cylinder forming phase and PEO is the majority block. Compared to previous work, we can amplify etch contrast by inclusion of hard mask material into the matrix block allowing the cylinder polymer to be removed and the exposed substrate subject to deep etching thereby generating uniform, arranged, sub-25 nm cylindrical nanopore arrays. Briefly, selective metal ion inclusion into the PEO matrix and subsequent processing (etch/modification) was applied for creating iron oxide nanohole arrays. The oxide nanoholes (22 nm diameter) were cylindrical, uniform diameter and mimics the original BCP nanopatterns. The oxide nanohole network is demonstrated as a resistant mask to fabricate ultra dense, well ordered, good sidewall profile silicon nanopore arrays on substrate surface through the pattern transfer approach. The Si nanopores have uniform diameter and smooth sidewalls throughout their depth. The depth of the porous structure can be controlled via the etch process.en
dc.description.statusPeer revieweden
dc.description.versionPublished Versionen
dc.identifier.citationGhoshal, T., Holmes, J. D. and Morris, M. A. (2018) 'Development of Ordered, Porous (Sub-25 nm Dimensions) Surface Membrane Structures Using a Block Copolymer Approach', Scientific Reports, 8(1), 7252 (11pp). doi:10.1038/s41598-018-25446-0en
dc.identifier.journaltitleScientific Reportsen
dc.publisherSpringer Natureen
dc.relation.projectinfo:eu-repo/grantAgreement/SFI/SFI Research Centres/12/RC/2278/IE/Advanced Materials and BioEngineering Research Centre (AMBER)/en
dc.relation.projectinfo:eu-repo/grantAgreement/SFI/SFI Industry Fellowship/15/IFB/3626/IE/Innovative protocol for the development of nanoporous/nanostructured materials patterning using block copolymer lithography for advanced optoelectronic thermal management/en
dc.rights© The Author(s) 2018. Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit
dc.subjectSynthesis and processingen
dc.subjectBlock copolymer lithographyen
dc.subjectOxide nanohole networken
dc.subjectNanoporous arraysen
dc.titleDevelopment of ordered, porous (sub-25 nm dimensions) surface membrane structures using a block copolymer approachen
dc.typeArticle (peer-reviewed)en
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