Block co-polymers for nanolithography: rapid microwave annealing for pattern formation on substrates

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dc.contributor.authorBorah, Dipu
dc.contributor.authorRasappa, Sozaraj
dc.contributor.authorSenthamaraikannan, Ramsankar
dc.contributor.authorHolmes, Justin D.
dc.contributor.authorMorris, Michael A.
dc.contributor.funderScience Foundation Irelanden
dc.date.accessioned2016-01-28T12:31:48Z
dc.date.available2016-01-28T12:31:48Z
dc.date.issued2015-03-30
dc.date.updated2015-03-31T08:45:01Z
dc.description.abstractThe integration of block copolymer (BCP) self-assembled nanopattern formation as an alternative lithographic tool for nanoelectronic device fabrication faces a number of challenges such as defect densities, feature size, pattern transfer, etc. Key barriers are the nanopattern process times and pattern formation on current substrate stack layers such as hard masks (e.g., silicon nitride, Si3N4). We report a rapid microwave assisted solvothermal (in toluene environments) self-assembly and directed self-assembly of a polystyrene-block-polydimethylsiloxane (PS-b-PDMS) BCP thin films on planar and topographically patterned Si3N4 substrates. Hexagonally arranged, cylindrical structures were obtained and good pattern ordering was achieved. Factors affecting BCP self-assembly, notably anneal time and temperature, were studied and seen to have significant effects. Graphoepitaxy within the topographical structures provided long range, translational alignment of the patterns. The effect of surface topography feature size and spacing was investigated. The solvothermal microwave based technique used to provide periodic order in the BCP patterns showed significant promise and ordering was achieved in much shorter periods than more conventional thermal and solvent annealing methods. The implications of the work in terms of manufacturing technologies are discussed.en
dc.description.sponsorshipScience Foundation Ireland (SFI CSET, CRANN, (SFI grant no. 09/IN.1/602));en
dc.description.statusPeer revieweden
dc.description.versionPublished Versionen
dc.format.mimetypeapplication/pdfen
dc.identifier.citationBORAH, D., RASAPPA, S., SENTHAMARAIKANNAN, R., HOLMES, J. D. & MORRIS, M. A. 2015. Block Co-Polymers for Nanolithography: Rapid Microwave Annealing for Pattern Formation on Substrates. Polymers, 7, 592-609. doi: 10.3390/polym7040592en
dc.identifier.doi10.3390/polym7040592
dc.identifier.endpage609en
dc.identifier.issn2073-4360
dc.identifier.issued4en
dc.identifier.journaltitlePolymeren
dc.identifier.startpage592en
dc.identifier.urihttps://hdl.handle.net/10468/2225
dc.identifier.volume7en
dc.language.isoenen
dc.publisherMDPI - Open Access Publishingen
dc.relation.urihttp://www.mdpi.com/journal/polymers
dc.rights© 2015 by the authors; licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution license.en
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/en
dc.subjectPolymer brushen
dc.subjectBlock copolymeren
dc.subjectSilicon nitride substrateen
dc.subjectSolvothermal processen
dc.subjectMicrowave annealen
dc.subjectSelf-assemblyen
dc.subjectGraphoepitaxyen
dc.subjectPlasma etchingen
dc.subjectPS-b-PDMSen
dc.subjectSelf-assembled nanolithographyen
dc.subjectThin filmsen
dc.subjectLithographyen
dc.subjectSiliconen
dc.subjectOrientationen
dc.subjectArraysen
dc.subjectFabricationen
dc.subjectSystemsen
dc.subjectPMMAen
dc.titleBlock co-polymers for nanolithography: rapid microwave annealing for pattern formation on substratesen
dc.typeArticle (peer-reviewed)en
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