Interface chemistry of contact metals and ferromagnets on the topological insulator Bi2Se3

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dc.check.date2018-10-02
dc.check.infoAccess to this article is restricted for 12 months after publication by request of the publisher.en
dc.contributor.authorWalsh, Lee A.
dc.contributor.authorSmyth, Christopher M.
dc.contributor.authorBarton, Adam T.
dc.contributor.authorWang, Qingxiao
dc.contributor.authorChe, Zifan
dc.contributor.authorYue, Ruoyu
dc.contributor.authorKim, Jiyoung
dc.contributor.authorKim, Moon J.
dc.contributor.authorWallace, Robert M.
dc.contributor.authorHinkle, Christopher L.
dc.contributor.funderNational Institute of Standards and Technologyen
dc.contributor.funderNational Science Foundationen
dc.contributor.funderHorizon 2020en
dc.contributor.funderScience Foundation Irelanden
dc.contributor.funderSemiconductor Research Corporationen
dc.date.accessioned2017-10-09T11:58:33Z
dc.date.available2017-10-09T11:58:33Z
dc.date.issued2017-10-02
dc.description.abstractThe interface between the topological insulator Bi2Se3 and deposited metal films is investigated using x-ray photoelectron spectroscopy including conventional contact metals (Au, Pd, Cr, and Ir) and magnetic materials (Co, Fe, Ni, Co0.8Fe0.2, and Ni0.8Fe0.2). Au is the only metal to show little or no interaction with the Bi2Se3, with no interfacial layer between the metal and the surface of the TI. The other metals show a range of reaction behaviors with the relative strength of reaction (obtained from the amount of Bi2Se3 consumed during reaction) ordered as: Au < Pd < Ir < Co ≤ CoFe < Ni < Cr < NiFe < Fe, in approximate agreement with the behavior expected from the Gibbs free energies of formation for the alloys formed. Post metallization anneals at 300°C in vacuum were also performed for each interface. Several of the metal films were not stable upon anneal and desorbed from the surface (Au, Pd, Ni, and Ni0.8Fe0.2), while Cr, Fe, Co, and Co0.8Fe0.2 showed accelerated reactions with the underlying Bi2Se3, including inter-diffusion between the metal and Se. Ir was the only metal to remain stable following anneal, showing no significant increase in reaction with the Bi2Se3. This study reveals the nature of the metal-Bi2Se3 interface for a range of metals. The reactions observed must be considered when designing Bi2Se3 based devices.en
dc.description.sponsorshipNational Institute of Standards and Technology and Semiconductor Research Corporation (the SWAN Center,South West Academy of Nanoelectronics); National Science Foundation (NSF Award No. 1407765 under the US/Ireland UNITE collaboration)en
dc.description.statusPeer revieweden
dc.description.versionAccepted Versionen
dc.format.mimetypeapplication/pdfen
dc.identifier.citationWalsh, L. A., Smyth, C. M., Barton, A. T., Wang, Q., Che, Z., Yue, R., Kim, J., Kim, M. J., Wallace, R. M. and Hinkle, C. L. (2017) 'Interface Chemistry of Contact Metals and Ferromagnets on the Topological Insulator Bi2Se3', The Journal of Physical Chemistry C. In Press. doi: 10.1021/acs.jpcc.7b08480en
dc.identifier.doi10.1021/acs.jpcc.7b08480
dc.identifier.endpage62en
dc.identifier.issn1932-7447
dc.identifier.journaltitleJournal of Physical Chemistry Cen
dc.identifier.startpage1en
dc.identifier.urihttps://hdl.handle.net/10468/4847
dc.language.isoenen
dc.publisherAmerican Chemical Societyen
dc.relation.projectinfo:eu-repo/grantAgreement/EC/H2020::MSCA-COFUND-FP/713567/EU/Cutting Edge Training - Cutting Edge Technology/EDGEen
dc.relation.projectinfo:eu-repo/grantAgreement/SFI/SFI Research Centres/12/RC/2278/IE/Advanced Materials and BioEngineering Research Centre (AMBER)/en
dc.rights© American Chemical Society. This document is the Accepted Manuscript version of a Published Work that appears in final form in Journal of Physical Chemistry C, copyright © American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see http://pubs.acs.org/doi/abs/10.1021/acs.jpcc.7b08480en
dc.subjectX-ray photoelectron spectroscopyen
dc.subjectTopological insulatoren
dc.subjectDeposited metal filmen
dc.subjectCrystalen
dc.titleInterface chemistry of contact metals and ferromagnets on the topological insulator Bi2Se3en
dc.typeArticle (peer-reviewed)en
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