Reduction and control of domain spacing by additive inclusion: morphology and orientation effects of glycols on microphase separated PS-b-PEO

Simple item page
dc.contributor.authorGhoshal, Tandra
dc.contributor.authorShaw, Matthew T.
dc.contributor.authorHolmes, Justin D.
dc.contributor.authorMorris, Michael A.
dc.contributor.funderScience Foundation Irelanden
dc.contributor.funderSemiconductor Research Corporationen
dc.date.accessioned2018-09-13T11:57:20Z
dc.date.available2018-09-13T11:57:20Z
dc.date.issued2015-03-17
dc.date.updated2018-08-07T12:51:39Z
dc.description.abstractCylindrical phase polystyrene-b-polyethylene oxide (PS-b-PEO) block copolymer (BCP) was combined with lower molecular weight poly/ethylene glycols at different concentrations and their effect on the microphase separation of BCP thin films were studied. Well-ordered microphase separated, periodic nanostructures were realized using a solvent annealing approach for solution cast thin films. By optimizing solvent exposure time, the nature and concentration of the additives etc. the morphology and orientation of the films can be controlled. The addition of the glycols to PS-b-PEO enables a simple method by which the microdomain spacing of the phase separated BCP can be controlled at dimensions below 50nm. Most interestingly, the additives results in an expected increase in domain spacing (i.e. pitch size) but in some conditions an unexpected reduction in domain spacing. The pitch size achieved by modification is in the range of 16–31nm compared to an unmodified BCP system which exhibits a pitch size of 25nm. The pitch size modification achieved can be explained in terms of chemical structure, solubility parameters, crystallinity and glass transition temperature of the PEO because the additives act as PEO ‘stress cracking agents’ whereas the PS matrix remains chemically unaffected.en
dc.description.sponsorshipSemiconductor Research Corporation (2011-IN2194)en
dc.description.statusPeer revieweden
dc.description.versionAccepted Versionen
dc.format.mimetypeapplication/pdfen
dc.identifier.citationGhoshal, T., Shaw, M. T., Holmes, J. D. and Morris, M. A. (2015) 'Reduction and control of domain spacing by additive inclusion: Morphology and orientation effects of glycols on microphase separated PS-b-PEO', Journal of Colloid and Interface Science, 450, pp. 141-150. doi: 10.1016/j.jcis.2015.03.022en
dc.identifier.doi10.1016/j.jcis.2015.03.022
dc.identifier.endpage150en
dc.identifier.issn0021-9797
dc.identifier.journaltitleJournal of Colloid and Interface Scienceen
dc.identifier.startpage141en
dc.identifier.urihttps://hdl.handle.net/10468/6776
dc.identifier.volume450en
dc.language.isoenen
dc.publisherElsevieren
dc.relation.projectinfo:eu-repo/grantAgreement/SFI/SFI Starting Investigator Research Grant (SIRG)/09/SIRG/I1621/IE/Tuning surface and dopant properties of silicon and germanium nanowires for high performance nanowire-based field-effect transistors/en
dc.relation.urihttp://www.sciencedirect.com/science/article/pii/S0021979715002817
dc.rights© 2015 Elsevier Inc. All rights reserved. This manuscript version is made available under the CC-BY-NC-ND 4.0 licenseen
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/4.0/en
dc.subjectSelf-assemblyen
dc.subjectBlock copolymeren
dc.subjectDomain spacing reductionen
dc.subjectAdditives and glycolsen
dc.subjectMorphology and orientationen
dc.titleReduction and control of domain spacing by additive inclusion: morphology and orientation effects of glycols on microphase separated PS-b-PEOen
dc.typeArticle (peer-reviewed)en
Files
Original bundle
Now showing 1 - 1 of 1
Thumbnail Image
Name:
JCIS-15-275R2.pdf
Size:
3.72 MB
Format:
Adobe Portable Document Format
Description:
Accepted version
Download
License bundle
Now showing 1 - 1 of 1
Thumbnail Image
Name:
license.txt
Size:
2.71 KB
Format:
Item-specific license agreed upon to submission
Description:
Download
Collections
Chemistry - Journal Articles
Tyndall National Institute - Journal Articles