Electronic structure evolution in dilute carbide Ge1-xCx alloys and implications for device applications

dc.contributor.authorBroderick, Christopher A.
dc.contributor.authorDunne, Michael D.
dc.contributor.authorTanner, Daniel S. P.
dc.contributor.authorO'Reilly, Eoin P.
dc.contributor.funderScience Foundation Irelanden
dc.contributor.funderNational University of Irelanden
dc.date.accessioned2020-01-14T10:11:00Z
dc.date.available2020-01-14T10:11:00Z
dc.date.issued2019-11-20
dc.date.updated2019-12-04T09:58:01Z
dc.description.abstractWe present a theoretical analysis of electronic structure evolution in the highly-mismatched dilute carbide group-IV alloy Ge1−xCx. For ordered alloy supercells, we demonstrate that C incorporation strongly perturbs the conduction band (CB) structure by driving the hybridization of A1-symmetric linear combinations of Ge states lying close in energy to the CB edge. This leads, in the ultradilute limit, to the alloy CB edge being formed primarily of an A1-symmetric linear combination of the L-point CB edge states of the Ge host matrix semiconductor. Our calculations describe the emergence of a “quasidirect” alloy bandgap, which retains a significant admixture of indirect Ge L-point CB edge character. We then analyze the evolution of the electronic structure of realistic (large, disordered) Ge1−xCx alloy supercells for C compositions up to x=2%. We show that short-range alloy disorder introduces a distribution of localized states at energies below the Ge CB edge, with these states acquiring minimal direct (Γ) character. Our calculations demonstrate strong intrinsic inhomogeneous energy broadening of the CB edge Bloch character, driven by hybridization between Ge host matrix and C-related localized states. The trends identified by our calculations are markedly different to those expected based on a recently proposed interpretation of the CB structure based on the band anticrossing model. The implications of our findings for device applications are discussed.en
dc.description.sponsorshipNational University of Ireland (Post-Doctoral Fellowship in the Sciences)en
dc.description.statusPeer revieweden
dc.description.versionPublished Versionen
dc.format.mimetypeapplication/pdfen
dc.identifier.articleid195702en
dc.identifier.citationBroderick, C. A., Dunne, M. D., Tanner, D. S. P. and O'Reilly, E. P. (2019) 'Electronic structure evolution in dilute carbide Ge1-xCx alloys and implications for device applications', Journal of Applied Physics, 126(19), 195702 (15pp). doi: 10.1063/1.5111976en
dc.identifier.doi10.1063/1.5111976en
dc.identifier.eissn1089-7550
dc.identifier.endpage15en
dc.identifier.issn0021-8979
dc.identifier.issued19en
dc.identifier.journaltitleJournal of Applied Physicsen
dc.identifier.startpage1en
dc.identifier.urihttps://hdl.handle.net/10468/9498
dc.identifier.volume126en
dc.language.isoenen
dc.publisherAIP Publishingen
dc.relation.projectinfo:eu-repo/grantAgreement/SFI/SFI Investigator Programme/15/IA/3082/IE/Multiscale Simulation and Analysis of emerging Group IV and III-V Semiconductor Materials and Devices/en
dc.relation.urihttps://aip.scitation.org/doi/abs/10.1063/1.5111976
dc.rights© 2019, the Authors. Published under license by AIP Publishing. This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared Broderick, C. A., Dunne, M. D., Tanner, D. S. P. and O'Reilly, E. P. (2019) 'Electronic structure evolution in dilute carbide Ge1-xCx alloys and implications for device applications', Journal of Applied Physics, 126(19), 195702 (15pp), doi: 10.1063/1.5111976 and may be found at https://doi.org/10.1063/1.5111976en
dc.subjectElectronic structure evolutionen
dc.subjectC incorporationen
dc.subjectConduction banden
dc.subjectQuasidirecten
dc.subjectAlloy bandgapen
dc.subjectGe1−xCxen
dc.titleElectronic structure evolution in dilute carbide Ge1-xCx alloys and implications for device applicationsen
dc.typeArticle (peer-reviewed)en
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