Writing self-assembled monolayers with Cs: Optimization of atomic nanolithography imaging using self-assembled monolayers on gold substrates

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dc.contributor.authorO'Dwyer, Colm
dc.contributor.authorGay, G.
dc.contributor.authorViaris de Lesegno, B.
dc.contributor.authorWeiner, J.
dc.contributor.authorLudolph, K.
dc.contributor.authorAlbert, D.
dc.contributor.authorOesterschulze, E.
dc.date.accessioned2016-07-08T14:24:07Z
dc.date.available2016-07-08T14:24:07Z
dc.date.issued2005-05-25
dc.date.updated2012-11-30T11:11:03Z
dc.description.abstractWe report the results of a study into the factors controlling the quality of nanolithographic imaging. Self-assembled monolayer (SAM) coverage, subsequent postetch pattern definition, and minimum feature size all depend on the quality of the Au substrate used in material mask atomic nanolithographic experiments. We find that sputtered Au substrates yield much smoother surfaces and a higher density of {111}-oriented grains than evaporated Au surfaces. Phase imaging with an atomic force microscope shows that the quality and percentage coverage of SAM adsorption are much greater for sputtered Au surfaces. Exposure of the self-assembled monolayer to an optically cooled atomic Cs beam traversing a two-dimensional array of submicron material masks mounted a few microns above the self-assembled monolayer surface allowed determination of the minimum average Cs dose (2 Cs atoms per self-assembled monolayer molecule) to write the monolayer. Suitable wet etching, with etch rates of 2.2 nm min-1, results in optimized pattern definition. Utilizing these optimizations, material mask features as small as 230 nm in diameter with a fractional depth gradient of 0.820 nm were realized.en
dc.description.statusPeer revieweden
dc.description.versionAccepted Versionen
dc.format.mimetypeapplication/pdfen
dc.identifier.articleid114309
dc.identifier.citationO'Dwyer, C. Gay, G., de Lesegno, B. V., Weiner, J., Ludolph, K., Albert, D. and Oesterschulze, E. (2005) 'Writing self-assembled monolayers with Cs: Optimization of atomic nanolithography imaging using self-assembled monolayers on gold substrates'. Journal of Applied Physics, 97,11, 114309. http://scitation.aip.org/content/aip/journal/jap/97/11/10.1063/1.1921342en
dc.identifier.doi10.1063/1.1921342
dc.identifier.endpage114309 (12)en
dc.identifier.issn0021-8979
dc.identifier.issued11en
dc.identifier.journaltitleJournal of Applied Physicsen
dc.identifier.startpage114309 (1)en
dc.identifier.urihttps://hdl.handle.net/10468/2849
dc.identifier.volume97en
dc.language.isoenen
dc.publisherAmerican Institute of Physics (AIP)en
dc.rights© 2005 AIP. This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. The following article appeared in Journal of Applied Physics, Vol 97:11, 114309 (2005) and may be found at http://scitation.aip.org/content/aip/journal/jap/97/11/10.1063/1.1921342en
dc.subjectAtomic lithographyen
dc.subjectGold substratesen
dc.subjectSelf assembled monolayer adsorptionen
dc.subjectSelf assembly monolayersen
dc.subjectGolden
dc.subjectImaging techniquesen
dc.subjectMonolayersen
dc.subjectNanotechnologyen
dc.subjectOptimizationen
dc.subjectSubstratesen
dc.subjectSelf assemblyen
dc.titleWriting self-assembled monolayers with Cs: Optimization of atomic nanolithography imaging using self-assembled monolayers on gold substratesen
dc.typeArticle (peer-reviewed)en
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