The morphology of ordered block copolymer patterns as probed by high resolution imaging

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dc.contributor.authorBorah, Dipu
dc.contributor.authorGhoshal, Tandra
dc.contributor.authorShaw, Matthew T.
dc.contributor.authorChaudhari, Atul
dc.contributor.authorPetkov, Nikolay
dc.contributor.authorBell, A. P.
dc.contributor.authorHolmes, Justin D.
dc.contributor.authorMorris, Michael A.
dc.contributor.funderScience Foundation Irelanden
dc.contributor.funderEuropean Commissionen
dc.date.accessioned2016-02-29T09:36:08Z
dc.date.available2016-02-29T09:36:08Z
dc.date.issued2014-09-22
dc.date.updated2015-05-26T10:34:22Z
dc.description.abstractThe microphase separation of block copolymer (BCP) thin films can afford a simple and cost-effective means to studying nanopattern surfaces, and especially the fabrication of nanocircuitry. However, because of complex interface effects and other complications, their 3D morphology, which is often critical for application, can be more complex than first thought. Here, we describe how emerging microscopic methods may be used to study complex BCP patterns and reveal their rich detail. These methods include helium ion microscopy (HIM) and high resolution x-section transmission electron microscopy (XTEM), and complement conventional secondary electron and atomic force microscopies (SEM and TEM). These techniques reveal that these structures are quite different to what might be expected. We illustrate the advances in the understanding of BCP thin film morphology in several systems, which result from this characterization. The systems described include symmetric, lamellar forming polystyrene-b-polymethylmethacrylate (PS-b-PMMA), cylinder forming polystyrene-b-polydimethylsiloxane (PS-b-PDMS), as well as lamellar and cylinder forming patterns of polystyrene-b-polyethylene oxide (PS-b-PEO) and polystyrene-b-poly-4-vinylpyridine (PS-b-P4VP). Each of these systems exhibits more complex arrangements than might be first thought. Finding and developing techniques whereby complex morphologies, particularly at very small dimensions, can be determined is critical to the practical use of these materials in many applications. The importance of quantifying these complex morphologies has implications for their use in integrated circuit manufacture, where they are being explored as alternative pattern forming methods to conventional UV lithography.en
dc.description.sponsorshipScience Foundation Ireland (SFI Research Centre Grant AMBER, SFI 12/RC/2278 and Principal Investigator Grant 09/IN.1/I2602); European Commission (EU ENIAC support for PLACYD)en
dc.description.statusPeer revieweden
dc.description.versionPublished Versionen
dc.format.mimetypeapplication/pdfen
dc.identifier.citationBORAH, D., GHOSHAL, T., SHAW, M. T., CHAUDHARI, A., PETKOV, N., BELL, A. P., HOLMES, J. D. & MORRIS, M. A. 2014. The Morphology of Ordered Block Copolymer Patterns as Probed by High Resolution Imaging. Nanomaterials and Nanotechnology, 4. doi: 10.5772/59098en
dc.identifier.doi10.5772/59098
dc.identifier.endpage25(13)en
dc.identifier.issn1847-9804
dc.identifier.issued25en
dc.identifier.journaltitleNanomaterials and Nanotechnologyen
dc.identifier.startpage25(1)en
dc.identifier.urihttps://hdl.handle.net/10468/2411
dc.identifier.volume4en
dc.language.isoenen
dc.publisherInTechen
dc.relation.urihttp://www.intechopen.com/journals/nanomaterials_and_nanotechnology
dc.rights© 2014 The Authors. Licensee InTech. This is an open access article distributed under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/3.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.en
dc.rights.urihttp://creativecommons.org/licenses/by/3.0/en
dc.subjectBlock copolymeren
dc.subjectThin filmsen
dc.subjectDefectsen
dc.subjectPolystyrene-b-polymethylmethacrylateen
dc.subjectPolystyrene-b-polyvinylypyridineen
dc.subjectPolystyrene-b-polyethylene oxideen
dc.subjectPolystyrene-b-polydimethyl siloxaneen
dc.subjectElectron microscopyen
dc.subjectHelium ion microscopyen
dc.titleThe morphology of ordered block copolymer patterns as probed by high resolution imagingen
dc.typeArticle (peer-reviewed)en
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