Interface roughness, carrier localization, and wave function overlap in c-Plane (In,Ga)N/GaN quantum wells: interplay of well width, alloy microstructure, structural inhomogeneities, and Coulomb effects

dc.contributor.authorTanner, Daniel S. P.
dc.contributor.authorMcMahon, Joshua M.
dc.contributor.authorSchulz, Stefan
dc.contributor.funderScience Foundation Irelanden
dc.date.accessioned2019-02-27T12:35:20Z
dc.date.available2019-02-27T12:35:20Z
dc.date.issued2018-09-14
dc.date.updated2019-02-27T12:20:11Z
dc.description.abstractIn this work, we present a detailed analysis of the interplay of Coulomb effects and different mechanisms that can lead to carrier-localization effects in c-plane (In,Ga)N/GaN quantum wells. As mechanisms for carrier localization, we consider here effects introduced by random alloy fluctuations as well as structural inhomogeneities such as well-width fluctuations. Special attention is paid to the impact of the well width on the results. All calculations have been carried out in the framework of atomistic tight-binding theory. Our theoretical investigations show that independent of the well widths studied here, carrier-localization effects due to built-in fields, well-width fluctuations, and random-alloy fluctuations dominate over Coulomb effects in terms of charge-density redistributions. However, the situation is less clear cut when the well-width fluctuations are absent. For a large well width (approximately >2.5nm), charge-density redistributions are possible, but the electronic and optical properties are basically dominated by the out-of-plane carrier separation originating from the electrostatic built-in field. The situation changes for lower well widths (<2.5nm), where the Coulomb effect can lead to significant charge-density redistributions and, thus, might compensate for a large fraction of the spatial in-plane wave-function separation observed in a single-particle picture. Given that this in-plane separation has been regarded as one of the main drivers behind the green gap problem, our calculations indicate that radiative recombination rates might significantly benefit from a reduced quantum-well-barrier-interface roughness.en
dc.description.statusPeer revieweden
dc.description.versionPublished Versionen
dc.format.mimetypeapplication/pdfen
dc.identifier.articleid034027
dc.identifier.citationTanner, D. S. P., McMahon, J. M. and Schulz, S. (2018) 'Interface roughness, carrier localization, and wave function overlap in c-Plane (In,Ga)N/GaN quantum wells: interplay of well width, alloy microstructure, structural inhomogeneities, and Coulomb effects', Physical Review Applied, 10(3), 034027 (19pp). doi:10.1103/PhysRevApplied.10.034027en
dc.identifier.doi10.1103/PhysRevApplied.10.034027
dc.identifier.endpage19en
dc.identifier.issn2331-7019
dc.identifier.issued3en
dc.identifier.journaltitlePhysical Review Applieden
dc.identifier.startpage1en
dc.identifier.urihttps://hdl.handle.net/10468/7550
dc.identifier.volume10en
dc.language.isoenen
dc.publisherAmerican Physical Societyen
dc.relation.projectinfo:eu-repo/grantAgreement/SFI/SFI Starting Investigator Research Grant (SIRG)/13/SIRG/2210/IE/Shaping the electronic and optical properties of non- and semi-polar nitride-based semiconductor nanostructures/en
dc.relation.urihttps://link.aps.org/doi/10.1103/PhysRevApplied.10.034027
dc.rights© 2018, American Physical Society. All rights reserved.en
dc.subjectCoulomb effectsen
dc.subjectCarrier-localization effectsen
dc.subjectc-plane (In,Ga)N/GaN quantum wellsen
dc.subjectReduced quantum-well-barrier-interface roughnessen
dc.titleInterface roughness, carrier localization, and wave function overlap in c-Plane (In,Ga)N/GaN quantum wells: interplay of well width, alloy microstructure, structural inhomogeneities, and Coulomb effectsen
dc.typeArticle (peer-reviewed)en
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