Solution processable metal oxide thin film deposition and material growth for electronic and photonic devices

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dc.contributor.authorGlynn, Colm
dc.contributor.authorO'Dwyer, Colm
dc.contributor.funderIrish Research Councilen
dc.contributor.funderScience Foundation Irelanden
dc.date.accessioned2018-05-09T11:12:55Z
dc.date.available2018-05-09T11:12:55Z
dc.date.issued2016-12-27
dc.date.updated2018-05-03T07:25:21Z
dc.description.abstractA comprehensive review of recent advances in solution processing and growth of metal-oxide thin films for electronic and photonic devices is presented, with specific focus on precise solution-based technological coatings for electronics and optics, and new concepts for oxide material growth for electrochemical, catalytic, energy storage and conversion systems, information technology, semiconductor device processing and related devices. Throughout, the nature of the soluble precursors solutions and their relationship to film formation process by various solution coating techniques are collated and compared, highlighting advantages in precursor design for creating complex oxides for devices. Because of the versatility of solution-processable oxides and functional material coating, it is important to capture the advances made in oxide deposition for plastic electronics, see-through and wearable devices, and high-fidelity thin film transistors on curved or flexible displays. Solution processing, even for oxides, allows control over composition, thickness, optical constants, porosity, doping, tunable optical absorbance/transmission, band structure engineering, 3D-substrate coating, complex composite oxide formation and multi-layered oxide systems that are more difficult to achieve using chemical vapor deposition (CVD) or atomic layer deposition (ALD) processes. We also discuss limitations of solution processing for some technologies and comment on the future of solution-based processing of metal-oxide materials for electronics, photonics and other technologies.en
dc.description.sponsorshipIrish Research Council (RS/2011/797); Science Foundation Ireland (National Access Programme (NAP 417))en
dc.description.statusPeer revieweden
dc.description.versionAccepted Versionen
dc.format.mimetypeapplication/pdfen
dc.identifier.citationColm, G. and Colm, O. D. (2017) 'Solution Processable Metal Oxide Thin Film Deposition and Material Growth for Electronic and Photonic Devices', Advanced Materials Interfaces, 4(2), 1600610 (36 pp). doi: 10.1002/admi.201600610en
dc.identifier.doi10.1002/admi.201600610
dc.identifier.endpage1600610-36en
dc.identifier.issn2196-7350
dc.identifier.issn2196-7350
dc.identifier.issued2en
dc.identifier.journaltitleAdvanced Materials Interfacesen
dc.identifier.startpage1600610-1en
dc.identifier.urihttps://hdl.handle.net/10468/6046
dc.identifier.volume4en
dc.language.isoenen
dc.publisherWileyen
dc.relation.projectinfo:eu-repo/grantAgreement/SFI/SFI Technology and Innovation Development Award (TIDA)/13/TIDA/E2761/IE/LiONSKIN - Moldable Li-ion battery outer skin for electronic devices/en
dc.relation.projectinfo:eu-repo/grantAgreement/SFI/SFI Technology and Innovation Development Award (TIDA)/15/TIDA/2893/IE/Advanced Battery Materials for High Volumetric Energy Density Li-ion Batteries for Remote Off-Grid Power/en
dc.relation.urihttp://onlinelibrary.wiley.com/doi/10.1002/admi.201600610/abstract
dc.rights© 2016 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. This is the peer reviewed version of the following article: C. Glynn, C. O'Dwyer, Adv. Mater. Interfaces 2017, 4, 1600610, which has been published in final form at https://doi.org/10.1002/admi.201600610. This article may be used for non-commercial purposes in accordance with Wiley Terms and Conditions for Self-Archiving.en
dc.subjectElectronicsen
dc.subjectMetal oxidesen
dc.subjectPhotonicsen
dc.subjectSolution processingen
dc.subjectThin filmsen
dc.titleSolution processable metal oxide thin film deposition and material growth for electronic and photonic devicesen
dc.typeArticle (peer-reviewed)en
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